Abstract

A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel …

Legal parties

Party
Inventors (applicants): Harun Solak
Assignees (initial): Eulitha AG (Villigen, CH)
Agents: Werner H. Stemer (attorney), Ralph E. Locher (attorney), Laurence A. Greenberg (attorney)

The application was examined by Christopher Young (USPTO dept. 1721)

Claims

  • 1. A method of printing a desired periodic or quasi-periodic pattern of dot features …
  • 2. The method according to claim 1 , wherein the step of designing the mask …
  • 3. The method according to claim 1 , wherein the ring feature is substantially circular. …

International priority data

EP: 09014217 / Nov. 13, 2009 (regional)

Cited documents

Patents

  • EP 1810085 B1, Jul. 1, 2007

Brief Description of the Several Views of the Drawing

Preferred examples of the present invention are hereinafter described with reference to the following figures: FIG. 1 is a schematic diagram illustrating the general principle of the present invention. …

Description

Field of the Invention

Fabricating periodic patterns of high-resolution features on substrates is important for many applications. In particular, the formation of two-dimensional arrays of holes and posts with sub-micron dimensions is important for such …

Description of the Invention

The general principle of the present invention for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer formed on a substrate is schematically illustrated in FIG. …

More details about Optimized Mask Design for Fabricating Periodic and Quasi-Periodic Patterns

Miscellaneous patent data

The examination was conducted by Christopher Young, the main examiner (1721 USPTO department), the exemplary patent drawings are first embodiment of the present, table of selected values, dependencies of properties of the intensity, Optimized Mask Design for Fabricating, particularly claims a method of printing a desired periodic or quasi-periodic pattern of dot features…, developed by Harun Solak, the grant number is 08617775, the protection scope is defined by 21 claims, assigned to a foreign company or corporation, the published agent's name is Stemer Werner H., the assignee company is Eulitha AG located in Villigen (CH), the invention description is illustrated by 10 drawings, 24 figures are supplied with the description, similar categories include development inhibitor or development inhibitor releasing agent, the binders being polyamides or polyimides, Stabilizing or fog inhibiting ingredient containing, prepared by montage processes, Including imagewise removal of image receiving layer or portion thereof, Alternating PSM, e.g. Levenson-Shibuya PSM, Preparation thereof, Polymeric diazonium compound, Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles, Mask blanks or pellicles therefor, Containers specially adapted therefor, Preparation thereof, Substrates, Identified applied voltage, the invention is named Optimized Mask Design for Fabricating Periodic and Quasi-Periodic Patterns, the grant date is Dec. 31, 2013 (publication date), the inventor's first name is Harun, and his last name is Solak, categorized under Including Control Feature Responsive to a Test or Measurement as a primary classification, the known applicant's name is Harun Solak, the application publication date is Sep. 14, 2010, numbered 13/509,642 (application), the claim number 1 is selected as exemplary.

Invention classification information

The invention is classified under Lithographic, Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles, Mask blanks or pellicles therefor, Containers specially adapted therefor, Preparation thereof, Phase shift masks [PSM], PSM blanks, Preparation thereof, Pattern elevated in radiation unexposed areas, Including Control Feature Responsive to a Test or Measurement, Effecting Frontal Radiation Modification During Exposure, e.g., Screening, Masking, Stenciling, Etc., Post image treatment to produce elevated pattern, Exposure, Apparatus therefor. The designated search classifications include Effecting Frontal Radiation Modification During Exposure, e.g., Screening, Masking, Stenciling, Etc., Pattern elevated in radiation unexposed areas, Lithographic, Including Control Feature Responsive to a Test or Measurement, Post image treatment to produce elevated pattern.

Patent details
Publication number 08617775
Publication date Dec. 31, 2013
Kind code B2
Application number 13/509,642
Application date Sep. 14, 2010
Application type U
Application series code 13
Int. pub. country WO
Int. pub. number WO2011/057835
Int. publication May. 19, 2011
Int. filing country WO
Int. filing PCT/EP2010/063431
Filed internationally Sep. 14, 2010
National stage date Jul. 10, 2012
National classification 430/30
Total number of claims 21
Exemplary claims 1
Number of drawings 10
Number of figures 24
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