Abstract

An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is …

Legal parties

Party
Inventors (applicants): Yasufumi Nishii, Kenichi Shiraishi, Tomoharu Fujiwara
Assignees (initial): Nikon Corporation (Tokyo, JP)
Agents: Oliff & Berridge, PLC (attorney)

The application was examined by Christina Riddle, Toan Ton (USPTO dept. 2882)

Claims

  • 1. A maintenance method comprising: …
  • 2. The method according to claim 1 , wherein the stage holds the substrate to expose …
  • 3. The method according to claim 1 , wherein …

International priority data

JP: 2004-353093 / Dec. 6, 2004 (national)

Cited documents

Patents

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Brief Description of the Drawings

FIG. 1 is a schematic diagram showing an exposure apparatus embodiment. FIG. 2 is an enlarged view of the main part of FIG. 1 . …

Description

Technical Field

The present invention relates to a maintenance method of an exposure apparatus, a maintenance device, an exposure apparatus, and a device manufacturing …

Other Patent Relations

This is a Continuation of application Ser. No. 11/662,452 filed Mar. 12, 2007, which in turn is a National Phase of Application No. PCT/JP2005/022308 filed Dec. 5, 2005, which claims …

Best Mode for Carrying Out the Invention

In the following, embodiments of the present invention will be described referring to the drawings, but the present invention is not limited to those embodiments. <Exposure Apparatus> An embodiment of an exposure …

More details about Maintenance Method, Maintenance Device, Exposure Apparatus, and Device Manufacturing Method

Miscellaneous patent data

The grant publication date is Jun. 4, 2013, the agent's company - Oliff & Berridge, PLC, the patent was extended by 159 days, the exemplary patent drawings are Schematic diagram showing an exposure, Drawing for illustrating a first, Maintenance Method, Maintenance Device, Exposure, Enlarged view of the main, numbered 12/805,715 (application), the grant number is 08456608 (publication number), the assignee location is Tokyo (JP); its company is Nikon Corporation, 40 claims comprise the protection scope, the application publication date is Aug. 16, 2010, the assignee is a foreign company or corporation, the invention is named Maintenance Method, Maintenance Device, Exposure Apparatus, and Device Manufacturing Method, the invention details are shown in 11 figures, the applicant's last name is Nishii, and his first name is Yasufumi, invented by Kenichi Shiraishi et al., the exemplary claims include number 1, the application was examined by Christina Riddle, Toan Ton (2882 USPTO department), the patent particularly claims a maintenance method comprising…, the recorded inventor's name is Fujiwara Tomoharu, illustrated by 9 drawings, categorized under With temperature or foreign particle control as a primary classification, similar categories include Projectors combined with typing apparatus or with printing apparatus, Single rigid plate with multiple slots or other apertures, film severing, cylindrical or curved exposure station structure, Combinations of cameras, projectors, or photographic printing apparatus with non-photographic non-optical apparatus, e.g. clocks, weapons, Cameras having the shape of other objects, Having document handling detection, Control effected by hand adjustment of a member that senses indication of a pointer of a built-in light-sensitive device, e.g. by restoring pointer to a fixed associated reference mark, Regulating light intensity or exposure time, Double flap, Reflector between original and photo-sensitive paper.

Invention classification information

The invention is classified under Details, for automatic sequential copying of the same original, Projection printing apparatus, e.g. enlarger, copying camera, Focus or magnification control, Step and repeat, Methods, Baseboards, masking frames, or other holders for the sensitive material, With temperature or foreign particle control, Detailed holder for photosensitive paper, Introducing or correcting distortion, e.g. in connection with oblique projection, Distortion introducing or rectifying. The designated search classifications include Distortion introducing or rectifying, Step and repeat, With temperature or foreign particle control, Controlling web, strand, strip, or sheet, Original moves continuously, Focus or magnification control, Radiation mask, Making electrical device, Irradiation of Objects or Material, Irradiation of semiconductor devices, Pattern control, Methods, Micrography, Process, Composition, or Product Other Than Microelectronic Device Manufacture, Including Control Feature Responsive to a Test or Measurement.

Patent details
Publication number 08456608
Publication date Jun. 4, 2013
Kind code B2
Application number 12/805,715
Application date Aug. 16, 2010
Application type U
Application series code 12
Extension term 159
National classification 355/30
Total number of claims 40
Exemplary claims 1
Number of drawings 9
Number of figures 11
Terminal disclaimer
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