Abstract

An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a compound capable of generating a specific acid having a norbornyl structure upon irradiation with an actinic ray or radiation, and (B) a resin capable of increasing the dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin …

Legal parties

Party
Inventors (applicants): Shuhei Yamaguchi
Assignees (initial): FUJIFILM Corporation (Tokyo, JP)
Agents: Sughrue Mion, PLLC (attorney)

The application was examined by Sin J. Lee (USPTO dept. 1722)

Claims

  • 1. An actinic ray-sensitive or radiation-sensitive resin composition, comprising: …
  • 2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , …
  • 3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 2 , …

International priority data

JP: 2009-008260 / Jan. 16, 2009 (national)

Cited documents

Patents

  • Hirayama et al. US 2005/0014090 A1, Jan. 1, 2005
  • JP 2007-155925 A, Jun. 1, 2007
  • Hirayama et al. US 2009/0130605 A1, May. 1, 2009
  • Hirayama et al. US 2007/0178394 A1, Aug. 1, 2007
  • Kato et al. US 2010/0009288 A1 / 430/270.1, Jan. 1, 2010
  • Kanda et al. US 2007/0134588 A1 / 430/270.1, Jun. 1, 2007
  • WO 2004-068242 A1, Aug. 1, 2004
  • Nakagawa et al. US 2009/0202945 A1 / 430/286.1, Aug. 1, 2009
  • Lin et al. US 2005/0147920 A1 / 430/311, Jul. 1, 2005
  • Ebata et al. US 2007/0054214 A1 / 430/270.1, Mar. 1, 2007
  • JP 2001-188346 A, Jul. 1, 2001
  • WO WO2007/058345 A1, May. 1, 2007
  • WO WO2007/116664 A1, Oct. 1, 2007
  • Nakamura et al. US 2009/0305161 A1 / 430/270.1, Dec. 1, 2009

Description

Background of the Invention

1. Field of the Invention The present invention relates to an actinic ray-sensitive or radiation-sensitive resin composition, in particular, an actinic ray-sensitive or radiation-sensitive resin composition for use in the process …

Detailed Description of the Invention

The best mode for carrying out the present invention is described below. Incidentally, in the present invention, when a group (atomic group) is denoted without specifying whether substituted or unsubstituted …

Examples

The present invention is described in greater detail below by referring to Examples, but the present invention should not be construed as being limited thereto. <Synthesis of Resin> Synthesis of Resin …

More details about Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same

Miscellaneous patent data

Categorized under Radiation sensitive composition or product or process of making as a primary classification, the protection scope is defined by 17 claims, developed by Shuhei Yamaguchi, the known applicant's name is Shuhei Yamaguchi, numbered 12/688,182 (application), the published inventor's name is Yamaguchi Shuhei, similar categories include Toner having identified external additive on outside of toner particle, having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing, Plural fixing of single toner image, Reflectors, projecting methods, Cadmium containing, Cyanine chromophore, the binders being polyamides or polyimides, multiple exposure, e.g. combined processes for line photo and screen, Having developer releasing compound, particularly claims an actinic ray-sensitive or radiation-sensitive resin composition, comprising…, the assignee location is Tokyo (JP); its organization is FUJIFILM Corporation, the application publication date is Jan. 15, 2010, the grant number is 08450041, the claim number 1 is selected as exemplary, the grant date is May. 28, 2013 (publication date), assigned to a foreign company or corporation, the invention is named Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same, the recorded agent's company name - Sughrue Mion, PLLC, the patent extension term is 406 days, was examined by 1722 USPTO department, the examiner - Sin J. Lee.

Invention classification information

The invention is classified under Polyolefin or halogen containing, Polymer of unsaturated acid or ester, Nitrogen compound containing, Pattern elevated in radiation unexposed areas, Polyamide or polyurethane, Imagewise removal using liquid means, Exposure, Apparatus therefor, Halogen compound containing, Making electrical device, Polyester, Sulfur compound containing, Macromolecular compounds which are photodegradable, e.g. positive electron resists, Binder containing, Radiation sensitive composition or product or process of making.

Patent details
Publication number 08450041
Publication date May. 28, 2013
Kind code B2
Application number 12/688,182
Application date Jan. 15, 2010
Application type U
Application series code 12
Extension term 406
National classification 430/270.1
Total number of claims 17
Exemplary claims 1
Terminal disclaimer
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