Abrading patents

Chemical Mechanical Polishing Device and Polishing Element
US 08851959 B2, Oct. 7, 2014, Scouring or polishing means, Mingqi Li et al. / Semiconductor Manufacturing International (Shanghai) Corporation (Shanghai, CN
A polishing apparatus used in a chemical mechanical polishing device, comprising:…

Apparatus and Method for In-Situ Endpoint Detection for Semiconductor Processing Operations
US 08795029 B2, Aug. 5, 2014, By optical sensor, Manoocher Birang et al. / Applied Materials, Inc. (Santa Clara, US)
An endpoint detection method, comprising:…

Sweeper Burnish Head
US 08758092 B2, June 24, 2014, Side face of disk, Pranesh K. Swamy et al. / Seagate Technology LLC (Cupertino, US)
A method comprising:…

Counter-Rotating Polisher
US 08662965 B2, March 4, 2014, Rotary disk tool, Kewei Wang et al. / Hammer Electric Power Tools Co., Ltd. (Zhuji, Zhejiang Province, CN)
A counter-rotating polisher, comprising:…

Control of Overpolishing of Multiple Substrates on the Same Platen in Chemical Mechanical Polishing
US 08616935 B2, Dec. 31, 2013, Computer controlled, Ingemar Carlsson et al. / Applied Materials, Inc. (Santa Clara, US)
A polishing method, comprising:…

Running Bases
US 08616937 B2, Dec. 31, 2013, Combined abrading, Jonathan R. Histed
A method of polishing a running base to provide improved running speed and glide…

Double-Disc Grinding Apparatus and Method for Producing Wafer
US 08562390 B2, Oct. 22, 2013, Glass or stone abrading, Tadahiro Kato et al. / Shin-Etsu Handotai Co., Ltd. (Tokyo, JP)
A double-disc grinding apparatus having at least: a rotatable ring-shaped holder…

Thin Polishing Pad With Window and Molding Process
US 08562389 B2, Oct. 22, 2013, By optical sensor, Boguslaw A. Swedek et al. / Applied Materials, Inc. (Santa Clara, US)
A polishing pad, comprising:…

Multi-Spindle Chemical Mechanical Planarization Tool
US 08535118 B2, Sept. 17, 2013, Glass or stone abrading, Mahadevaiyer Krishnan et al. / International Business Machines Corporation (Armonk, US)
An apparatus for chemical mechanical planarization comprising:…

Cathodically-Protected Pad Conditioner and Method of Use
US 08496511 B2, July 30, 2013, With tool treating or forming, Vincent J. Laraia et al. / 3M Innovative Properties Company (St. Paul, US)
A cathodically-protected pad conditioner for chemical mechanical planarization…

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