Featured patents

Chemically Amplified Negative Resist Composition and Patterning Process
US 08835096 B2, Sept. 16, 2014, Radiation sensitive composition or product or process of making, Satoshi Watanabe et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A chemically amplified negative resist composition comprising a polymer, adapted…

Electrophotographic Photoreceptor, Process Cartridge, Image Forming Apparatus, Cured Film, and Organic Electroluminescent Device
US 08859173 B2, Oct. 14, 2014, Product having overlayer on radiation-conductive layer, Takatsugu Doi et al. / Fuji Xerox Co., Ltd. (Tokyo, JP)
An electrophotographic photoreceptor comprising:…

Positive Resist Composition and Pattern-Forming Method Using the Same
US 08741537 B2, June 3, 2014, Radiation sensitive composition or product or process of making, Hiromi Kanda / FUJIFILM Corporation (Tokyo, JP)
A positive resist composition, which comprises a resin having a structure showing…

Methods of Forming a Pattern in a Material and Methods of Forming Openings in a Material to Be Patterned
US 08685630 B2, April 1, 2014, Forming nonplanar surface, Michael Hyatt et al. / Micron Technology, Inc. (Boise, US)
A method of forming a pattern in a material, the method comprising:…

Photomask Blank, Method of Manufacturing the Same, Photomask, and Method of Manufacturing the Same
US 08663876 B2, March 4, 2014, Radiation mask, Masahiro Hashimoto et al. / Hoya Corporation (Tokyo, JP)
A photomask blank for use in the manufacture of a photomask adapted to be applied…

Photosensitive Resin Laminate and Thermal Processing of the Same
US 08652761 B2, Feb. 18, 2014, Relief, Ryan W. Vest et al.
A method of thermally developing a photocurable printing blank to produce…

Method for Making a Lithographic Printer Plate Precursor
US 08632954 B2, Jan. 21, 2014, Lithographic, Peter Hendrikx et al. / Agfa Graphics NV (Mortsel, BE)
A method for making a lithographic printing plate precursor comprising the steps…

Radiation-Sensitive Resin Composition, Polymer and Compound
US 08609321 B2, Dec. 17, 2013, Radiation sensitive composition or product or process of making, Mitsuo Sato et al. / JSP Corporation (Tokyo, JP)
A radiation-sensitive resin composition comprising a polymer having a structural…

Reflective Mask Blank and Method of Manufacturing a Reflective Mask
US 08546047 B2, Oct. 1, 2013, Radiation mask, Morio Hosoya / Hoya Corporation (Tokyo, JP)
A reflective mask blank, comprising:…

Compound and Photoresist Composition Containing the Same
US 08475999 B2, July 2, 2013, Amide, Mitsuhiro Hata et al. / Sumitomo Chemical Company, Limited (Tokyo, JP)
A photoresist composition comprising a resin,…

Patentorg has 1838 documents under Radiation Imagery Chemistry: Process, Composition, or Product Thereof Patents.

Narrow down the browsing criteria below to see more patents.

Select a subcategory
Quick navigation
New documents
  • Process for the Production of the Actinobacillus Pleuropneumoniae Toxins APXI or APXIII in a Liquid Culture Medium Under Supply of Air Enriched in Carbon Dioxide
  • Method for Manufacturing Nonvolatile Memory Device
  • Supply Chain Demand Satisfaction
  • Supply-Line Management Device
  • Storage Control Device and Method for Managing Snapshot