Featured patents

Self-Imageable Film Forming Polymer, Compositions Thereof and Devices and Structures Made Therefrom
US 08753790 B2, June 17, 2014, Polymeric mixture, Andrew Bell et al. / Promerus, LLC (Brecksville, US)
A film forming polymer composition comprising:…

Image Holding Member for Image Forming Apparatus, Process Cartridge, and Image Forming Apparatus
US 08741515 B2, June 3, 2014, Radiation-conductive composition contains hetero ring, Hidekazu Hirose et al. / Fuji Xerox Co., Ltd. (Tokyo, JP)
An image holding member for an image forming apparatus, comprising:…

Resist Composition and Method for Producing Resist Pattern
US 08685619 B2, April 1, 2014, Radiation sensitive composition or product or process of making, Satoshi Yamamoto et al. / Sumitomo Chemcial Company, Limited (Tokyo, JP)
A resist composition comprising…

Easily Dispersible Pigment Preparation Based on C.I. Pigment Yellow 155
US 08623579 B2, Jan. 7, 2014, Azo containing adjuvant, Eusebio Ruiz Fernandez et al. / Clariant Finance (BVI) Limited (Tortola, VG
A solid pigment preparation comprising…

Laser-Reflective Mask and Method for Manufacturing Same
US 08614032 B2, Dec. 24, 2013, Radiation mask, Hyeong Ryeol Yoon et al. / WI-A Corporation (Suwon-si, KR)
A fabricating method of a laser reflective mask, the method comprising the steps…

Device and Method for Providing Wavelength Reduction With a Photomask
US 08563198 B2, Oct. 22, 2013, Radiation mask, Jen-Chieh Shih et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A photomask for forming a pattern during photolithography when illuminated…

Electron Beam Data Storage System and Method for High Volume Manufacturing
US 08507159 B2, Aug. 13, 2013, Including Control Feature Responsive to a Test or Measurement, Ru-Gun Liu et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method comprising:…

Multilayer Reflective Film Coated Substrate for a Reflective Mask, Reflective Mask Blank, and Methods of Manufacturing the Same
US 08512918 B2, Aug. 20, 2013, Radiation mask, Tsutomu Shoki / Hoya Corporation (Tokyo, JP)
A multilayer reflective film coated substrate for a reflective mask, comprising…

System, Method and Apparatus for Pattern Clean-Up During Fabrication of Patterned Media Using Forced Assembly of Molecules
US 08481245 B2, July 9, 2013, Electron beam imaging, Dan Saylor Kercher et al. / HGST Netherlands B.V. (Amsterdam, NL)
A method of forming a pattern, comprising:…

Printing Conductive Lines
US 08465905 B2, June 18, 2013, Making electrical device, Israel Schuster / Eastman Kodak Company (Rochester, US)
An apparatus for printing conductive lines on a substrate comprising:…

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