Featured patents

Electrophotographic Member, Process Cartridge and Electrophotographic Apparatus
US 08846287 B2, Sept. 30, 2014, Using chemically identified application member, Kazuhito Wakabayashi et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An electrophotographic member comprising a substrate, an elastic layer,…

Salt, Photoresist Composition and Method for Producing Photoresist Pattern
US 08802352 B2, Aug. 12, 2014, Radiation sensitive composition or product or process of making, Isao Yoshida et al. / Sumitomo Chemical Company, Limited (Tokyo, JP)
A salt represented by formula (I):…

Mask and Method for Fabricating Semiconductor Device
US 08790851 B2, July 29, 2014, Radiation mask, Taketo Kuriyama et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A photo mask for exposing comprising:…

Resist Composition, Method of Forming Resist Pattern, and Polymeric Compound
US 08778595 B2, July 15, 2014, Radiation sensitive composition or product or process of making, Jun Iwashita et al. / Tokyo Ohka Kogyo Co., Ltd. (Kawasaki-shi, JP)
A resist composition, comprising a base component (A) which generates acid…

Method of Manufacturing Toner Carrier, Device for Manufacturing Toner Carrier, Toner Carrier, Development Agent, and Process Cartridge
US 08765350 B2, July 1, 2014, Carrier core coating, Kousuke Suzuki et al. / Ricoh Company, Ltd. (Tokyo, JP)
A method of manufacturing toner carrier comprising a core and a cover formed…

Toner for Developing Electrostatic Images and Method for Producing the Same
US 08652724 B2, Feb. 18, 2014, Carboxylic acid or ester compound adjuvant, Azusa Wada / Zeon Corporation (Tokyo, JP)
A toner for developing electrostatic images, comprising a binder resin,…

Radiation-Sensitive Resin Composition, Polymer and Compound
US 08603726 B2, Dec. 10, 2013, Radiation sensitive composition or product or process of making, Yusuke Asano et al. / JSR Corporation (Tokyo, JP)
A radiation-sensitive resin composition comprising (A) a polymer that includes…

Patterning Nano-Scale Patterns on a Film Comprising Unzipping Copolymers
US 08574815 B2, Nov. 5, 2013, Radiation sensitive composition or product or process of making, Jane E. Frommer et al. / International Business Machines Corporation (Armonk, US)
An imaging medium comprising a single layer of a polymer film, the single layer…

Radiation Sensitive Resin Composition and Method of Forming an Interlayer Insulating Film
US 08563214 B2, Oct. 22, 2013, And monomeric processing ingredient, Masakazu Shibasaki et al. / Sharp Corporation (Osaka-shi, JP)
A radiation sensitive resin composition comprising:…

Antireflective Coating Composition and Process Thereof
US 08486609 B2, July 16, 2013, Making electrical device, Douglas McKenzie et al. / AZ Electronic Materials USA Corp. (Somerville, US)
An antireflective coating composition comprising a crosslinker…

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