Featured patents

Method and System for E-Beam Lithography With Multi-Exposure
US 08835082 B2, Sept. 16, 2014, Including Control Feature Responsive to a Test or Measurement, Jeng-Horng Chen et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method for electron-beam (e-beam) lithography patterning, comprising:…

Reticles for Use in Forming Implant Masking Layers and Methods of Forming Implant Masking Layers
US 08802360 B2, Aug. 12, 2014, Plural Exposure Steps, Hans-Juergen Thees et al. / GLOBALFOUNDRIES Inc. (Grand Cayman, KY)
A method, comprising:…

Toner Image Stabilization Processes
US 08735043 B2, May 27, 2014, Forming overlayer on developed image, Chu-heng Liu / Xerox Corporation (Norwalk, US)
A method of printing halftone images, comprising:…

Light Sensitive Coating Compositions Useful for Lithographic Elements
US 08741536 B2, June 3, 2014, Radiation sensitive composition or product or process of making, Marjorie Arias et al. / IBF Industria Basileira de Filmes S/A (Rio de Janeiro, BR)
A radiation sensitive material, characterized in that it comprises a metal…

Toner for Electrophotography, Developer for Electrophotography, Toner Cartridge, Image Forming Apparatus, and Image Forming Method
US 08685602 B2, April 1, 2014, Metal oxide conmpound adjuvant, Emi Takahashi et al. / Fuji Xerox Co., Ltd. (Tokyo, JP)
A toner for electrophotography, comprising:…

Pattern Forming Process
US 08623590 B2, Jan. 7, 2014, Pattern elevated in radiation unexposed areas, Kenji Funatsu et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A pattern forming process comprising…

Method for Production of a Medical Marker
US 08597872 B2, Dec. 3, 2013, Optical device, Frank Krüger et al. / Heraeus Precious Metals GmbH & Co. KG (Hanau, DE)
A method for production of a ring-shaped and non-self-supporting medical marker…

Optically Variable Magnetic Stripe Assembly
US 08551673 B2, Oct. 8, 2013, Holographic Process, Composition, or Product, Brian William Holmes et al. / De La Rue International Limited (Hampshire, GB)
An optically variable magnetic stripe assembly consisting of: an adhesive layer;…

Functionalized Perfluoropolyether Material as a Hydrophobic Coating
US 08512935 B2, Aug. 20, 2013, Radiation sensitive composition comprising oxirane ring containing component, Sterling Chaffins et al. / Hewlett-Packard Development Company, L.P. (Houston, US)
A formulation for a hydrophobic photoresist coating to be applied to a surface…

Photomask Blank, Photomask, and Photomask Manufacturing Method
US 08518609 B2, Aug. 27, 2013, Radiation Modifying Product or Process of Making, Osamu Nozawa / Hoya Corporation (Tokyo, JP)
A photomask blank comprising:…

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