Featured patents

Reflective Mask Blank for EUV Lithography and Reflective Mask for EUV Lithography
US 08828627 B2, Sept. 9, 2014, Radiation mask, Kazuyuki Hayashi / Asahi Glass Company, Limited (Chiyoda-ku, Tokyo, JP)
A reflective mask for EUV lithography (EUVL) having a mask pattern region…

Radiation-Sensitive Resin Composition, Polymer, and Method for Forming Resist Pattern
US 08815490 B2, Aug. 26, 2014, Radiation sensitive composition or product or process of making, Yasuhiko Matsuda et al. / JSR Corporation (Tokyo, JP)
A radiation sensitive resin composition comprising,…

Method and Apparatus for Developing Process
US 08703392 B2, April 22, 2014, With formation of resist image, and etching of substrate or material deposition, Kuei-Shun Chen et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method of fabricating a semiconductor device, comprising:…

Mask and Method for Forming the Mask
US 08709682 B2, April 29, 2014, Radiation mask, Anthony Yen et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method for decreasing phase defects on a surface of a mask blank substrate…

Positive Resist Composition and Pattern Forming Method Using the Same
US 08697329 B2, April 15, 2014, Radiation sensitive composition or product or process of making, Shinichi Kanna et al. / FUJIFILM Corporation (Tokyo, JP)
A positive resist composition, which comprises:…

Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same
US 08663897 B2, March 4, 2014, Radiation sensitive composition or product or process of making, Takashi Masubuchi et al. / Central Glass Company, Limited (Ube-shi, JP)
A polymerizable fluorine-containing sulfonic acid or sulfonate having a structure…

Carrier, Developer for Replenishment, Developer Cartridge for Replenishment, and Image Forming Apparatus
US 08628904 B2, Jan. 14, 2014, Chemically or physically identified binder or coating resin for magnetic carrier, Koutarou Yoshihara et al. / Fuji Xerox Co., Ltd. (Tokyo, JP)
A carrier used in a trickle development system of an electrophotographic…

Toner and Method for Manufacturing the Same
US 08580473 B2, Nov. 12, 2013, Polyester backbone binder, Yasuhiro Shibai et al. / Sharp Kabushiki Kaisha (Osaka, JP)
A toner comprising:…

Reactants for Optical Data Storage Media and Methods for Use
US 08580463 B2, Nov. 12, 2013, Holographic Process, Composition, or Product, Evgenia Mikhailovna Kim et al. / General Electric Company (Schenectady, US)
An optical storage medium comprising:…

Photosensitive Compositions Useful for Forming Active Patterns, Methods of Forming Such Active Patterns and Organic Memory Devices Incorporating Such Active Patterns
US 08580484 B2, Nov. 12, 2013, Optical device, Myung Sup Jung et al. / Samsung Electronics Co., Ltd. (Gyeonggi-Do, KR)
A method of forming a memory cell comprising:…

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