Featured patents

Device for Manufacturing a Surface Using Character Projection Lithography With Variable Magnification
US 08852831 B2, Oct. 7, 2014, Radiation mask, Akira Fujimura / D2S, Inc. (San Jose, US)
A device for charged particle beam lithography comprising:…

Composition for Coating Over a Photoresist Pattern
US 08852848 B2, Oct. 7, 2014, Identified overlayer on radiation-sensitive layer, DongKwan Lee et al. / Z Electronic Materials USA Corp. (Somerville, US)
An aqueous composition for coating over a photoresist pattern comprising a first…

Line Width Roughness Improvement With Noble Gas Plasma
US 08753804 B2, June 17, 2014, Including etching substrate, Youn Gi Hong et al. / Lam Research Corporation (Fremont, US)
A method for etching features in an etch layer over a substrate and disposed…

Photoresist Stripping Solution and a Method of Stripping Photoresists Using the Same
US 08697345 B2, April 15, 2014, Removal of imaged layers, Shigeru Yokoi et al. / Tokyo Ohka Kogyo Co., Ltd. (Kanagawa-ken, JP)
A photoresist stripping solution comprising (a) a quaternary ammonium hydroxide…

Electrostatic Image Developing Toner, Electrostatic Image Developer, Process Cartridge, Image Forming Apparatus, and Image Forming Method
US 08652730 B2, Feb. 18, 2014, Polyester backbone binder, Hitomi Akiyama et al. / Fuji Xerox Co., Ltd. (Tokyo, JP)
An electrostatic image developing toner comprising:…

Toner
US 08647800 B2, Feb. 11, 2014, Hydrocarbon wax-containing adjuvant, Kenichi Nakayama et al. / Canon Kabushiki Kaisha (Tokyo, JP)
A toner comprising toner particles, each of which contains a binder resin,…

Plasticized Anti-Curl Back Coating for Flexible Imaging Member
US 08614038 B2, Dec. 24, 2013, Charge transport layer, Edward F. Grabowski et al. / Xerox Corporation (Norwalk, US)
A flexible imaging member comprising:…

Photosensitive Resin Composition
US 08557498 B2, Oct. 15, 2013, Radiation sensitive composition or product or process of making, Tomohiro Yorisue / Asahi Kasei E-Materials Corporation (Tokyo, JP)
A photosensitive resin composition, comprising:…

Photoresist Materials and Photolithography Processes
US 08507177 B2, Aug. 13, 2013, Radiation sensitive composition or product or process of making, Burn Jeng Lin et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A material for use in lithography processing, comprising:…

Method for Treating a Lithographic Printing Plate
US 08445179 B2, May 21, 2013, Lithographic, Hubertus Van Aert et al. / Agfa Graphics NV (Mortsel, BE)
A method for treating a heat-sensitive lithographic printing plate comprising…

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