Featured patents

Method and System for Design of a Reticle to Be Manufactured Using Variable Shaped Beam Lithography
US 08828628 B2, Sept. 9, 2014, Radiation mask, Akira Fujimura / D2S, Inc. (San Jose, US)
A method for optical proximity correction (OPC) comprising:…

Generalization of Shot Definitions for Mask and Wafer Writing Tools
US 08815473 B2, Aug. 26, 2014, Radiation mask, Steffen F. Schulze et al.
A method of writing patterns onto a substrate, comprising…

Compositions and Processes for Immersion Lithography
US 08871428 B2, Oct. 28, 2014, Radiation sensitive composition or product or process of making, George G. Barclay et al. / Rohm and Haas Electronics Materials LLC (Marlborough, US)
A method for processing a photoresist composition, comprising:…

Pattern Forming Method
US 08753803 B2, June 17, 2014, Including etching substrate, Yoshihisa Kawamura et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A pattern forming method, comprising:…

Resist Underlayer Film Forming Composition for Lithography, Containing Aromatic Fused Ring-Containing Resin
US 08709701 B2, April 29, 2014, Identified backing or protective layer containing, Tomoyuki Enomoto et al. / Nissan Chemical Industries, Ltd. (Tokyo, JP)
A resist underlayer film forming composition used in a lithography process…

Metal Conservation With Stripper Solutions Containing Resorcinol
US 08551682 B2, Oct. 8, 2013, Stripping Process or Element, John M. Atkinson et al. / Dynaloy, LLC (Kingsport, US)
A method for removing a resist from a substrate comprising the acts of:…

Silicate-Free Developer Compositions
US 08530143 B2, Sept. 10, 2013, Lithographic, Moshe Levanon et al. / Eastman Kodak Company (Rochester, US)
A method for providing a lithographic printing plate comprising:…

Photoconductors Containing Biaryl Polycarbonate Charge Transport Layers
US 08535859 B2, Sept. 17, 2013, Organic nitrogen in charge transport layer, Jin Wu / Xerox Corporation (Norwalk, US)
A photoconductor consisting of a supporting substrate, a photogenerating layer,…

Mark Position Detection Apparatus
US 08518614 B2, Aug. 27, 2013, Including Control Feature Responsive to a Test or Measurement, Shinichi Egashira / Canon Kabushiki Kaisha (Tokyo, JP)
An apparatus for detecting a position of a mark from a mark signal obtained…

Antireflective Coating Composition and Process Thereof
US 08445181 B2, May 21, 2013, Making electrical device, Mark Neisser et al. / AZ Electronic Materials USA Corp. (Somerville, US)
An antireflective coating comprising a mixture of a first polymer and a second…

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