Featured patents

Method of Forming Resist Pattern and Negative Tone-Development Resist Composition
US 08790868 B2, July 29, 2014, Hiroaki Shimizu et al. / Tokyo Ohka Kogyo Co., Ltd. (Kawasaki-shi, JP)
A method of forming a resist pattern, the method comprising: a step of forming…

Photoresist Developer and Method for Fabricating Substrate by Using the Developer Thereof
US 08808976 B2, Aug. 19, 2014, Seiji Tono et al. / Tokuyama Corporation (Yamaguchi, JP)
A positive photoresist developer comprising a basic aqueous solution containing…

Polymers, Photoresist Compositions and Methods of Forming Photolithographic Patterns
US 08628911 B2, Jan. 14, 2014, Young Cheol Bae et al. / Rohm and Haas Electronic Materials LLC (Marlborough, US)
A method of forming a photolithographic pattern, comprising:…

Patentorg has 7 documents under Developing Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
Quick navigation
New documents
  • Process for the Production of the Actinobacillus Pleuropneumoniae Toxins APXI or APXIII in a Liquid Culture Medium Under Supply of Air Enriched in Carbon Dioxide
  • Method for Manufacturing Nonvolatile Memory Device
  • Supply Chain Demand Satisfaction
  • Supply-Line Management Device
  • Storage Control Device and Method for Managing Snapshot