Featured patents

Diffraction Unlimited Photolithography
US 08697346 B2, April 15, 2014, Amy C. Sulivan et al. / The Regents of the University of Colorado (Denver, US)
A method of photo fabrication, comprising:…

Flood Exposure Process for Dual Tone Development in Lithographic Applications
US 08568964 B2, Oct. 29, 2013, Mark Somervell et al. / Tokyo Electron Limited (Tokyo, JP)
A method of patterning a substrate, comprising:…

Forming Sub-Lithographic Patterns Using Double Exposure
US 08609327 B2, Dec. 17, 2013, Kuang-Jung Chen et al. / International Business Machines Corporation (Armonk, US)
A method comprising:…

Mask Design and OPC for Device Manufacture
US 08778605 B2, July 15, 2014, Kevin J. Hooker et al. / Intel Corporation (Santa Clara, US)
A device manufacturing method for forming a target pattern of polygons…

Mask Set for Double Exposure Process and Method of Using the Mask Set
US 08778604 B2, July 15, 2014, Ming-Jui Chen et al. / United Microelectronics Corp. (Science-Based Industrial Park, Hsin-Chu, TW)
A method of forming a mask pattern on a substrate, comprising the steps…

Method of Forming a Pattern of an Array of Shapes Including a Blocked Region
US 08492079 B2, July 23, 2013, Chandrasekhar Sarma et al. / International Business Machines Corporation (Armonk, US)
A method of forming a patterned structure comprising:…

Method of Forming Tight-Pitched Pattern
US 08815498 B2, Aug. 26, 2014, Chun-Wei Wu / Nanya Technology Corp. (Kueishan, Tao-Yuan Hsien, TW)
A method of forming tight-pitched patterns, comprising:…

Methods for Exposure for the Purpose of Thermal Management for Imprint Lithography Processes
US 08609326 B2, Dec. 17, 2013, Byung-Jin Choi et al. / Molecular Imprints, Inc. (Austin, US)
A method of patterning a field located on a surface of a substrate…

Methods for Small Trench Patterning Using Chemical Amplified Photoresist Compositions
US 08592137 B2, Nov. 26, 2013, Chia-Chu Liu et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method for forming a pattern on a substrate, the method comprising:…

Methods of Lithographically Patterning a Substrate
US 08859195 B2, Oct. 14, 2014, Adam Olson et al. / Micron Technology, Inc. (Boise, US)
A method of lithographically patterning a substrate comprising photoresist…

Patterning Process and Resist Composition
US 08741554 B2, June 3, 2014, Masaki Ohashi et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A process for forming a pattern, comprising the steps of:…

Reticles for Use in Forming Implant Masking Layers and Methods of Forming Implant Masking Layers
US 08802360 B2, Aug. 12, 2014, Hans-Juergen Thees et al. / GLOBALFOUNDRIES Inc. (Grand Cayman, KY)
A method, comprising:…

Stitching Methods Using Multiple Microlithographic Expose Tools
US 08728722 B2, May 20, 2014, Joseph R. Summa et al. / Truesense Imaging, Inc. (Rochester, US)
In the production of a device, a method of forming an intermediate structure…

Patentorg has 13 documents under Plural Exposure Steps Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
Quick navigation
New documents
  • Process for the Production of the Actinobacillus Pleuropneumoniae Toxins APXI or APXIII in a Liquid Culture Medium Under Supply of Air Enriched in Carbon Dioxide
  • Method for Manufacturing Nonvolatile Memory Device
  • Supply Chain Demand Satisfaction
  • Supply-Line Management Device
  • Storage Control Device and Method for Managing Snapshot