Featured patents

Method for Removing Photoresist Pattern
US 08470519 B2, June 25, 2013, Jung-Geun Jhin et al. / Korea University Research and Business Foundation (Seoul, KR)
A method of removing a photoresist pattern, comprising radiating light…

Photoresist Removal
US 08679734 B2, March 25, 2014, David D. Bernhard et al. / Advanced Technology Materials, Inc. (Danbury, US)
A cleaning solution comprising a strong base, an oxidant, and a polar solvent,…

Photoresist Removal Method and Patterning Process Utilizing the Same
US 08785115 B2, July 22, 2014, Hung-Yi Wu et al. / United Microelectronics Corp. (Hsinchu, TW)
A photoresist removal method, comprising:…

Photoresist Stripping Solution and a Method of Stripping Photoresists Using the Same
US 08697345 B2, April 15, 2014, Shigeru Yokoi et al. / Tokyo Ohka Kogyo Co., Ltd. (Kanagawa-ken, JP)
A photoresist stripping solution comprising (a) a quaternary ammonium hydroxide…

Processess and Compositions for Removing Substances From Substrates
US 08614053 B2, Dec. 24, 2013, Edward Enns McEntire et al. / Eastman Chemical Company (Kingsport, US)
A single-stage process for removing a substance from a substrate comprising,…

Patentorg has 5 documents under Removal of Imaged Layers Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
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