Featured patents

Composition for Forming Upper Layer Film for Immersion Exposure, Upper Layer Film for Immersion Exposure, and Method of Forming Photoresist Pattern
US 08697344 B2, April 15, 2014, Norihiko Sugie et al. / JSR Corporation (Tokyo, JP)
A composition for forming an upper layer film in liquid immersion lithography,…

Polymer Compound, and Resist-Protecting Film Composition Including Same for a Liquid Immersion Exposure Process
US 08859194 B2, Oct. 14, 2014, Jae Hyun Kim et al. / Dongjin Semichem Co., Ltd. KR
A polymer compound comprising: 100 parts by mole of a repeating unit represented…

Resin Film Forming Method
US 08541165 B2, Sept. 24, 2013, Tomomi Sato / Fujitsu Limited (Kawasaki, JP)
A resin film forming method for forming a resin film over a substrate, the method…

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