Featured patents

Composition for Forming Resist Underlayer Film for Lithography Including Resin Containing Alicyclic Ring and Aromatic Ring
US 08822138 B2, Sept. 2, 2014, Hirokazu Nishimaki et al. / Nissan Chemical Industries, Ltd. (Tokyo, JP)
A composition for forming a resist underlayer film for lithography,…

Forming a Self-Aligned Hard Mask for Contact to a Tunnel Junction
US 08563225 B2, Oct. 22, 2013, Sivananda K. Kanakasabapathy et al. / International Business Machines Corporation (Armonk, US)
A method of forming a hard mask in a semiconductor device which is self-aligned…

Line Pattern Collapse Mitigation Through Gap-Fill Material Application
US 08795952 B2, Aug. 5, 2014, Benjamen M. Rathsack et al. / Tokyo Electron Limited JP
A method of patterning a substrate, comprising:…

Method for Fabricating a Circuit
US 08835101 B1, Sept. 16, 2014, Krishnakumar Mani / III Holdings 1, LLC (Wilmington, US)
A method for fabricating a circuit, said method comprising:…

Method for Fabricating a Circuit
US 08703393 B1, April 22, 2014, Krishnakumar Mani / MagSil Corporation (Santa Clara, US)
A method for fabricating a circuit, said method comprising:…

Method for Fabricating Dual Damascene Profiles Using Sub Pixel-Voting Lithography and Devices Made by Same
US 08652763 B2, Feb. 18, 2014, Uttam Reddy et al. / The Board of Trustees of the University of Illinois (Urbana, US)
A method for processing a substrate, said method comprising the steps of:…

Method for Fabricating Semiconductor Device
US 08574820 B2, Nov. 5, 2013, Chang-Goo Lee / Hynix Semiconductor Inc. (Gyeonggi-do, KR)
A method for fabricating a semiconductor device, comprising:…

Method for Forming Fine Pattern
US 08574819 B2, Nov. 5, 2013, Sarohan Park et al. / Hynix Semiconductor Inc. (Gyeonggi-do, KR)
A method comprising:…

Method for Forming Thin Film Pattern and Flat Display Device Having the Same
US 08703394 B2, April 22, 2014, Jeong-Oh Kim et al. / LG Display Co., Ltd. (Seoul, KR)
A method for forming a thin film pattern, comprising the steps of:…

Method for Manufacturing Semiconductor Device
US 08673543 B2, March 18, 2014, Toshihiko Tanaka / Renesas Electronics Corporation (Kanagawa, JP)
A method for manufacturing a semiconductor device having a wiring pattern…

Method for Patterning a Photosensitive Layer
US 08815496 B2, Aug. 26, 2014, Tsiao-Chen Wu et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method comprising:…

Method of Fabricating a Metallic Microstructure and Microstructure Obtained via the Method
US 08557506 B2, Oct. 15, 2013, Jean-Charles Fiaccabrino / Nivarox-FAR S.A. (Le Locle, CH)
A method of fabricating a bimetallic microstructure, wherein the method includes…

Method of Forming a Pattern in a Semiconductor Device and Method of Forming a Gate Using the Same
US 08846304 B2, Sept. 30, 2014, Hee-Sung Kang et al. / Samsung Electronics Co., Ltd. (Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR)
A method of manufacturing a semiconductor device, comprising:…

Method of Forming Gate Conductor Structures
US 08758984 B2, June 24, 2014, Yi-Nan Chen et al. / Nanya Technology Corp. (Kueishan, Tao-Yuan Hsien, TW)
A method of forming gate conductor structures, comprising:…

Method of Forming Mask Pattern
US 08551691 B2, Oct. 8, 2013, Hidetami Yaegashi / Tokyo Electron Limited (Tokyo, JP)
A method of forming a mask pattern comprising:…

Method of Forming Openings
US 08673544 B2, March 18, 2014, Jiunn-Hsiung Liao et al. / United Microelectronics Corp. (Science-Based Industrial Park, Hsin-Chu, TW)
A method for forming openings, comprising:…

Methods of Forming Patterns
US 08551690 B2, Oct. 8, 2013, Jonathan T. Doebler / Micron Technology, Inc. (Boise, US)
A method of forming a pattern, comprising:…

Methods of Manufacturing Semiconductor Devices Using Photolithography
US 08551689 B2, Oct. 8, 2013, Bo-Hee Lee et al. / Samsung Electronics Co., Ltd. KR
A method of manufacturing a semiconductor device using a photolithography…

Methods to Fabricate a Photoactive Substrate Suitable for Microfabrication
US 08709702 B2, April 29, 2014, Jeb H. Flemming et al. / 3D Glass Solutions (Albuquerque, US)
A method to fabricate a device with holes for electrical conduction comprising…

Pattern Forming Method and Manufacturing Method of Semiconductor Device
US 08815495 B2, Aug. 26, 2014, Eiichi Nishimura et al. / Tokyo Electron Limited (Tokyo, JP)
A mask pattern forming method comprising:…

Pattern Forming Method and Method for Producing Device
US 08795953 B2, Aug. 5, 2014, Soichi Owa et al. / Nikon Corporation (Tokyo, JP)
A pattern forming method for forming a pattern, the method comprising:…

Semiconductor Constructions and Methods of Forming Patterns
US 08815497 B2, Aug. 26, 2014, Zishu Zhang et al. / Micron Technology, Inc. (Boise, US)
A method of forming patterns, comprising:…

Patentorg has 22 documents under Etching of Substrate and Material Deposition Patents.

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