Featured patents

Acid-Etch Resistant, Protective Coatings
US 08771927 B2, July 8, 2014, Ramachandran K. Trichur et al. / Brewer Science Inc. (Rolla, US)
A method of forming a microelectronic structure, said method comprising:…

Aromatic Ring Containing Polymer, Underlayer Composition Including the Same, and Associated Methods
US 08697341 B2, April 15, 2014, Kyong-Ho Yoon et al. / Cheil Industries, Inc. (Gumi-Si, Kyeongsanbuk-Do, KR)
An aromatic ring-containing polymer including a group represented by one…

Double Exposure Technology Using High Etching Selectivity
US 08445182 B2, May 21, 2013, Jong-wook Kye et al. / Advanced Micro Devices, Inc. (Sunnyvale, US)
A semiconductor device prepared by a process comprising the steps of:…

Manufacturing Method of Semiconductor Device
US 08497060 B2, July 30, 2013, Koji Hashimoto / Kabushiki Kaisha Toshiba (Tokyo, JP)
A method of manufacturing a semiconductor device comprising:…

Mask Material Conversion
US 08486610 B2, July 16, 2013, Mirzafer K. Abatchev et al. / Micron Technology, Inc. (Boise, US)
A method of semiconductor processing, comprising:…

Material for Forming Resist Sensitization Film and Production Method of Semiconductor Device
US 08795951 B2, Aug. 5, 2014, Junichi Kon / Fujitsu Limited (Kawasaki, JP)
A method for producing a semiconductor device, comprising:…

Method and Apparatus for Developing Process
US 08703392 B2, April 22, 2014, Kuei-Shun Chen et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A method of fabricating a semiconductor device, comprising:…

Method for Fabricating Semiconductor Nano Circular Ring
US 08722312 B2, May 13, 2014, Shuangshuang Pu et al. / Peking University (Beijing, CN)
A method for fabricating a semiconductor nano circular ring, comprising:…

Method for Forming Resist Underlayer Film, Patterning Process Using the Same, and Composition for the Resist Underlayer Film
US 08450048 B2, May 28, 2013, Jun Hatakeyama et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A method for forming a resist underlayer film of a multilayer resist film having…

Method for Manufacturing a Semiconductor Device
US 08530145 B2, Sept. 10, 2013, Takuya Hagiwara / Renesas Electronics Corporation (Kawasaki-shi, Kanagawa, JP)
A method for manufacturing a semiconductor device, the method comprising:…

Method for Producing a High Resolution Resist Pattern on a Semiconductor Wafer
US 08715912 B2, May 6, 2014, Thomas Wallow et al. / Advanced Micro Devices, Inc. (Sunnyvale, US)
A method for producing a high resolution resist pattern on a semiconductor wafer,…

Method of Forming Fine Patterns of Semiconductor Device by Using Double Patterning Process Which Uses Acid Diffusion
US 08778598 B2, July 15, 2014, Yool Kang et al. / Samsung Electronics Co., Ltd. KR
A method of forming fine patterns of a semiconductor device, the method…

Method of Manufacturing Carbon Nanotube Device Array
US 08492076 B2, July 23, 2013, Eun-hong Lee et al. / Samsung Electronics Co., Ltd. (Gyeonggi-do, KR)
A method of manufacturing carbon nanotube (CNT) device arrays, the method…

Method of Manufacturing Electronic Device
US 08647816 B2, Feb. 11, 2014, Kyouhei Watanabe / Canon Kabushiki Kaisha (Tokyo, JP)
A method of manufacturing an electronic device, comprising:…

Method of Manufacturing Semiconductor Device and Pattern Formation Method
US 08445183 B2, May 21, 2013, Hiroyuki Miyamoto / Sony Corporation (Tokyo, JP)
A method of manufacturing a semiconductor device, comprising:…

Method of Measuring a Characteristic
US 08685626 B2, April 1, 2014, Christian Marinus Leewis et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method comprising:…

Methods for Adhering Materials, for Enhancing Adhesion Between Materials, and for Patterning Materials, and Related Semiconductor Device Structures
US 08728714 B2, May 20, 2014, Dan B. Millward / Micron Technology, Inc. (Boise, US)
A method for adhering materials, the method comprising:…

Multiple Exposure Photolithography Methods
US 08568960 B2, Oct. 29, 2013, Kuang-Jung Chen et al. / International Business Machines Corporation (Armonk, US)
A method comprising:…

Narrow Frame Touch Input Sheet, Manufacturing Method of Same, and Conductive Sheet Used in Narrow Frame Touch Input Sheet
US 08852852 B2, Oct. 7, 2014, Yuji Morikawa et al. / Nissha Printing Co., Ltd. (Kyoto, JP)
A method for manufacturing a narrow frame touch input sheet, comprising:…

Pattern Formation Method
US 08445184 B2, May 21, 2013, Takashi Matsuda / Panasonic Corporation (Osaka, JP)
A pattern formation method, comprising the steps of:…

Patterning Methods and Masks
US 08507186 B2, Aug. 13, 2013, Yayi Wei / Infineon Technologies AG (Neubiberg, DE)
A method of manufacturing a semiconductor device, the method comprising:…

Process for Forming an Anti-Oxidant Metal Layer on an Electronic Device
US 08450049 B2, May 28, 2013, Yie-Chuan Chiu et al. / Chipbond Technology Corporation (Hsinchu, TW)
A process for forming an anti-oxidant metal layer on an electronic device…

Self-Aligned Fine Pitch Permanent On-Chip Interconnect Structures and Method of Fabrication
US 08822137 B2, Sept. 2, 2014, Hosadurga Shobha et al. / International Business Machines Corporation (Armonk, US)
A method for fabricating an interconnect structure, comprising:…

Semiconductor Structure and Method of Fabricating the Same
US 08697340 B2, April 15, 2014, Hong-Ji Lee et al. / MACRONIX International Co., Ltd. (Hsinchu, TW)
A method of forming a semiconductor structure, comprising:…

Silicon-Containing Resist Underlayer Film-Forming Composition and Patterning Process
US 08715913 B2, May 6, 2014, Takafumi Ueda et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A silicon-containing resist underlayer film-forming composition containing…

Patentorg has 25 documents under With Formation of Resist Image, and Etching of Substrate or Material Deposition Patents.

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