Featured patents

Double Patterning by PTD and NTD Process
US 08835100 B2, Sept. 16, 2014, Chin Cheng Yang / Macronix International Co., Ltd. (Hsin-Chu, TW)
A method of making a photoresist pattern comprising:…

Manufacturing Method for Wiring
US 08460857 B2, June 11, 2013, Shunpei Yamazaki et al. / Semiconductor Energy Laboratory Co., Ltd. (Kanagawa-ken, JP)
A method of forming a resist pattern comprising:…

Method for Forming Fine Patterns of Semiconductor Device
US 08808971 B2, Aug. 19, 2014, Jae Seung Choi / SK hynix Inc. (Icheon-Si, KR)
A method for forming fine patterns of a semiconductor device, the method…

Method for Forming Fine Patterns of Semiconductor Device
US 08465908 B2, June 18, 2013, Jae Seung Choi / Hynix Semiconductor Inc. (Icheon-si, KR)
A method for forming fine patterns of a semiconductor device, the method…

Method of Forming Semiconductor Device by Using Reduction Projection Aligner
US 08455179 B2, June 4, 2013, Takanori Yamamoto / Renesas Electronics Corporation (Kawasaki-shi, Kanagawa, JP)
A method of forming a semiconductor device, the method comprising:…

Method of Manufacturing Electroforming Mold, Electroforming Mold, and Method of Manufacturing Electroformed Component
US 08518632 B2, Aug. 27, 2013, Hiroyuki Hoshina et al. / Seiko Instruments Inc. (Chiba-Shi, JP)
A method of manufacturing an electroforming mold, comprising:…

Method of Manufacturing Semiconductor Device
US 08507184 B2, Aug. 13, 2013, Sang Man Bae / SK hynix Inc. (Icheon-si, KR)
A method of manufacturing a semiconductor device, the method comprising:…

Methods of Forming Electronic Devices
US 08507185 B2, Aug. 13, 2013, Thomas Cardolaccia et al. / Rohm and Haas Electronic Materials LLC (Marlborough, US)
A method of forming an electronic device, comprising:…

Methods of Forming Electronic Devices
US 08492075 B2, July 23, 2013, Yi Liu et al. / Rohm and Haas Electronic Materials LLC (Marlborough, US)
A method of forming an electronic device, comprising:…

Pattern Forming Process, Chemically Amplified Positive Resist Composition, and Resist-Modifying Composition
US 08658346 B2, Feb. 25, 2014, Masashi Iio et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A multiple pattern-forming process comprising the steps of:…

Patterning Process
US 08741548 B2, June 3, 2014, Katsuya Takemura et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A process for forming a pattern comprising the steps of:…

Semiconductor Device Manufacturing Methods
US 08697339 B2, April 15, 2014, Jingyu Lian et al. / International Business Machines Corporation (Armonk, US)
A method of manufacturing a semiconductor device, the method comprising:…

Stitching Methods Using Multiple Microlithographic Expose Tools
US 08728713 B2, May 20, 2014, Eric J. Meisenzahl et al. / Truesense Imaging, Inc. (Rochester, US)
A method for producing a completed measurement structure using (i) a first…

Patentorg has 13 documents under Including Multiple Resist Image Formation Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
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