Featured patents

Alkali Developable Photosensitive Resin Composition and Dry Film Manufactured by the Same
US 08551687 B2, Oct. 8, 2013, Kwang-Joo Lee et al. / LG Chem, Ltd. (Seoul, KR)
A photosensitive resin composition comprising:…

Composition for Forming a Developable Bottom Antireflective Coating
US 08697336 B2, April 15, 2014, Shigemasa Nakasugi et al. / AZ Electronic Materials USA Corp. (Somerville, US)
A composition for forming a bottom anti-reflective coating, comprising…

Compound and Photoresist Composition Containing the Same
US 08475999 B2, July 2, 2013, Mitsuhiro Hata et al. / Sumitomo Chemical Company, Limited (Tokyo, JP)
A photoresist composition comprising a resin,…

Flexographic Printing Plate Precursor, Imaging Assembly, and Use
US 08530142 B2, Sept. 10, 2013, Gregory Lloyd Zwadlo / Eastman Kodak Company (Rochester, US)
A flexographic printing plate precursor that can be imaged and developed…

Polyimide Precursor, Resin Composition Comprising the Polyimide Precursor, Pattern Forming Method Using the Resin Composition, and Articles Produced by Using the Resin Composition
US 08859186 B2, Oct. 14, 2014, Katsuya Sakayori / Dai Nippon Printing Co., Ltd. (Tokyo-to, JP)
A polyimide precursor comprising repeating units represented by the following…

Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
US 08841064 B2, Sept. 23, 2014, Ji-Young Jeong et al. / Cheil Industries Inc. (Gumi-si, KR)
A positive photosensitive resin composition, comprising:…

Patentorg has 6 documents under Amide Patents.

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