Featured patents

Acid Amplifiers
US 08501382 B1, Aug. 6, 2013, Robert L. Brainard / The Research Foundation of State Univ. of New York (Albany, US)
A compound of formula…

Acrylate Derivative, Haloester Derivative, Polymer Compound and Photoresist Composition
US 08486606 B2, July 16, 2013, Takashi Fukumoto et al. / Kuraray Co., Ltd. (Kurashiki-shi, JP)
A method for producing an acrylate derivative of formula (1):…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using Same
US 08460850 B2, June 11, 2013, Shuhei Yamaguchi et al. / FUFIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Composition
US 08795944 B2, Aug. 5, 2014, Kaoru Iwato et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08846290 B2, Sept. 30, 2014, Michihiro Shirakawa et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08771916 B2, July 8, 2014, Yusuke Iizuka et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08617788 B2, Dec. 31, 2013, Akinori Shibuya et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08617785 B2, Dec. 31, 2013, Shuhei Yamaguchi / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08592128 B2, Nov. 26, 2013, Shuhei Yamaguchi / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Pattern Forming Method Using the Same
US 08450041 B2, May 28, 2013, Shuhei Yamaguchi / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition and Resist Film and Pattern Forming Method Using the Composition
US 08802349 B2, Aug. 12, 2014, Shuji Hirano et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Actinic Ray-Sensitive or Radiation-Sensitive Film and Pattern Forming Method Using the Composition
US 08673538 B2, March 18, 2014, Takeshi Inasaki et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Actinic Ray-Sensitive or Radiation-Sensitive Film and Pattern Forming Method Using the Composition
US 08574814 B2, Nov. 5, 2013, Tomotaka Tsuchimura et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Actinic Ray-Sensitive or Radiation-Sensitive Film and Pattern Forming Method Using the Same Composition
US 08846293 B2, Sept. 30, 2014, Shohei Kataoka et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Resist Film and Pattern Forming Method Using the Composition
US 08637220 B2, Jan. 28, 2014, Tomotaka Tsuchimura et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Resist Film and Pattern Forming Method Using the Same
US 08795945 B2, Aug. 5, 2014, Takamitsu Tomiga et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Resist Film and Pattern Forming Method Using the Same
US 08715903 B2, May 6, 2014, Hisamitsu Tomeba et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising (A)…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, and Resist Film, Pattern Forming Method, Method for Preparing Electronic Device, and Electronic Device, Each Using the Same
US 08790860 B2, July 29, 2014, Hidenori Takahashi et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, Film Formed Using the Composition and Pattern Forming Method Using the Same
US 08741542 B2, June 3, 2014, Tomotaka Tsuchimura et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, Resist Film Using the Composition and Pattern Forming Method
US 08735048 B2, May 27, 2014, Tomotaka Tsuchimura et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising (P)…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, Resist Film Using the Same and Pattern Forming Method
US 08541161 B2, Sept. 24, 2013, Kana Fujii et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic Ray-Sensitive or Radiation-Sensitive Resin Composition, Resist Film, Pattern Forming Method Using the Same, and Resin
US 08852845 B2, Oct. 7, 2014, Katsuhiro Yamashita et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic ray-sensitive or radiation-sensitive resin composition comprising:…

Actinic-Ray- or Radiation-Sensitive Resin Composition and Method of Forming a Pattern Using the Same
US 08642245 B2, Feb. 4, 2014, Hidenori Takahashi et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray- or radiation-sensitive resin composition comprising:…

Actinic-Ray- or Radiation-Sensitive Resin Composition and Method of Forming Pattern Using the Composition
US 08632938 B2, Jan. 21, 2014, Hiroshi Saegusa et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray- or radiation-sensitive resin composition comprising a hydrophobic…

Actinic-Ray- or Radiation-Sensitive Resin Composition and Method of Forming Pattern Using the Same
US 08541160 B2, Sept. 24, 2013, Akinori Shibuya / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray- or radiation-sensitive resin composition comprising:…

Actinic-Ray- or Radiation-Sensitive Resin Composition, Actinic-Ray- or Radiation-Sensitive Film Therefrom and Method of Forming Pattern
US 08865389 B2, Oct. 21, 2014, Hideaki Tsubaki et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray- or radiation-sensitive resin composition comprising a resin…

Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
US 08557499 B2, Oct. 15, 2013, Shuhei Yamaguchi et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray- or radiation-sensitive resin composition comprising a compound…

Actinic-Ray-Sensitive or Radiation-Sensitive Resin Composition, Resist Film and Pattern Forming Method Each Using the Composition, Method for Preparing Electronic Device, and Electronic Device
US 08841060 B2, Sept. 23, 2014, Naohiro Tango et al. / FUJIFILM Corporation (Tokyo, JP)
An actinic-ray-sensitive or radiation-sensitive resin composition comprising:…

Active Light Ray Sensitive or Radioactive Ray Sensitive Resin Composition, and Active Light Ray Sensitive or Radioactive Ray Sensitive Film and Pattern Forming Method Using the Same
US 08603727 B2, Dec. 10, 2013, Shuji Hirano et al. / FUJIFILM Corporation (Tokyo, JP)
An active light ray sensitive or radioactive ray sensitive resin composition…

Aluminum Substrates and Lithographic Printing Plate Precursors
US 08722308 B2, May 13, 2014, Koji Hayashi / Eastman Kodak Company (Rochester, US)
A lithographic printing plate precursor comprising a substrate and at least one…

Patentorg has 324 documents under Radiation Sensitive Composition or Product or Process of Making Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
Quick navigation
New documents
  • Process for the Production of the Actinobacillus Pleuropneumoniae Toxins APXI or APXIII in a Liquid Culture Medium Under Supply of Air Enriched in Carbon Dioxide
  • Method for Manufacturing Nonvolatile Memory Device
  • Supply Chain Demand Satisfaction
  • Supply-Line Management Device
  • Storage Control Device and Method for Managing Snapshot