Featured patents

Alignment Marks for Multi-Exposure Lithography
US 08455162 B2, June 4, 2013, Vinayan C. Menon et al. / International Business Machines Corporation (Armonk, US)
A method of forming a patterned structure comprising:…

LCD Panel Photolithography Process and Mask
US 08592111 B2, Nov. 26, 2013, Cai Ii Zhang / Shenzhen China Star Optoelectronics Technology Co., Ltd. (Guangdong, CN)
An LCD panel photolithography process, employed in a lithography system…

Lithography Process
US 08703368 B2, April 22, 2014, Ying Ying Wang et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A lithography process, comprising:…

Method and Apparatus for Performing Pattern Reconnection After Individual or Multipart Alignment
US 08530120 B2, Sept. 10, 2013, Mikael Wahlsten et al. / Micronic Mydata AB (Taby, SE)
A method for patterning a second layer of a workpiece in a direct write…

Method of Manufacturing a Photomask
US 08524426 B2, Sept. 3, 2013, Jin Choi et al. / Samsung Electronics Co. Ltd. (Suwon-si, Gyeonggi-do, KR)
A method of correcting a position error of a photomask, the method comprising:…

Photomask and Method for Forming Overlay Mark Using the Same
US 08535858 B2, Sept. 17, 2013, Chui Fu Chiu / Nanya Technology Corp. (Tao-Yuan Hsien, TW)
A method for forming an overlay mark in a substrate, comprising steps of:…

Roll-To-Roll Digital Photolithography
US 08486593 B2, July 16, 2013, Michael A. Haase et al. / 3M Innovative Properties Company (St. Paul, US)
A method of making a flexible circuit film, comprising:…

Single Field Zero Mask for Increased Alignment Accuracy in Field Stitching
US 08563202 B2, Oct. 22, 2013, Arthur Lam / Micrel, Inc. (San Jose, US)
A method for stitching a first field mask to a second field mask on a wafer…

Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
US 08709687 B2, April 29, 2014, Maurits Van Der Schaar et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method of measuring a parameter of performance of a lithographic process by…

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