Featured patents

Photosensitive Resin Composition, Photosensitive Dry Film and Method for Forming Pattern
US 08647806 B2, Feb. 11, 2014, Shigeki Watanabe et al. / Micro Process Inc (Koshigaya-shi, JP)
A photosensitive resin composition comprising:…

Photosensitive Resin Composition, Photosensitive Dry Film and Method for Forming Pattern
US 08647807 B2, Feb. 11, 2014, Shigeki Watanabe et al. / Micro Process Inc. (Koshigaya-shi, JP)
A photosensitive resin composition comprising:…

Positive Lift-Off Resist Composition and Patterning Process
US 08492067 B2, July 23, 2013, Yoshinori Hirano / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A positive lift-off resist composition comprising…

Positive Photosensitive Composition
US 08507171 B2, Aug. 13, 2013, Tomohiro Etou et al. / JNC Corporation (Tokyo, JP)
A photosensitive composition, comprising:…

Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
US 08815489 B2, Aug. 26, 2014, Jin-Young Lee et al. / Cheil Industries Inc. (Gumi-si, KR)
A positive photosensitive resin composition, comprising…

Positive-Type Radiation-Sensitive Composition, Cured Film, Interlayer Insulating Film, Method of Forming Interlayer Insulating Film, Display Device, and Siloxane Polymer for Forming Interlayer Insulating Film
US 08486604 B2, July 16, 2013, Hideaki Takase et al. / JSR Corporation (Tokyo, JP)
A positive-type radiation-sensitive composition comprising…

Radiation Sensitive Resin Composition and Method of Forming an Interlayer Insulating Film
US 08563214 B2, Oct. 22, 2013, Masakazu Shibasaki et al. / Sharp Corporation (Osaka-shi, JP)
A radiation sensitive resin composition comprising:…

Patentorg has 7 documents under And Monomeric Processing Ingredient Patents.

Other subcategories for category Radiation imagery chemistry: process, composition, or product thereof
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