Featured patents

Method for Manufacture of Semiconductor Bearing Thin Film Material
US 08821964 B1, Sept. 2, 2014, Photoelectric, Howard W. H. Lee et al. / Stion Corporation (San Jose, US)
A method for forming semiconductor bearing thin film material, the method…

Method for Making Carbon Nanotube Based Composite
US 08871300 B2, Oct. 28, 2014, Inorganic base, Li Wang et al. / Tsinghua University (Beijing, CN)
A method for making a carbon nanotube based composite, the method comprising:…

Method of Manufacturing Magnetoresistive Element
US 08685491 B2, April 1, 2014, Magnetic coating, Akihiko Takeo et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A method of manufacturing a magnetoresistive element comprising a layered…

Method and Device for Producing Polymer Laminations or Strand-Shaped Applications on a Substrate
US 08663749 B2, March 4, 2014, Plasma initiated polymerization, Alfred Link et al. / Sonderhoff Chemicals GmbH (Cologne, DE)
A process for the production of polymer layers or of strand-shaped applications…

Process for Controlling Coating Deposition
US 08673389 B2, March 18, 2014, Measuring, Testing, or Indicating, Markku Rajala et al. / Beneq Oy (Vantaa, FI)
A method for controlling a vapor deposition based coating process, comprising:…

Curved Touch Sensor
US 08603574 B2, Dec. 10, 2013, Optical Element Produced, Seung Jae Hong et al. / Apple Inc. (Cupertino, US)
A method of forming a curved touch surface, comprising:…

Fabricating Method of Electron-Emitting Device
US 08591984 B2, Nov. 26, 2013, Vapor deposition or spraying, Fu-Ming Pan et al. / Chunghwa Picture Tubes, Ltd. (Taoyuan, TW)
A fabricating method of an electron-emitting device, comprising:…

Vertical Film Formation Apparatus and Method for Using Same
US 08563096 B2, Oct. 22, 2013, Silicon oxides or nitrides, Masanobu Matsunaga et al. / Tokyo Electron Limited (Tokyo, JP)
A method for using a vertical film formation apparatus for forming a silicon…

Formation of Palladium Sulfide
US 08563092 B2, Oct. 22, 2013, Nonuniform or patterned coating, Boya Radha et al. / Jawaharial Nehru Centre for Advanced Scientific Research (Karnataka, IN)
A method for forming a palladium sulfide film on a substrate, the method…

Field-Aided Preferential Deposition of Precursors
US 08496999 B2, July 30, 2013, Pretreatment of substrate or post-treatment of coated substrate, Neil Dasgupta et al. / The Board of Trustees of the Leland Stanford Junior University (Palo Alto, US)
A method for performing area-selective atomic layer deposition, the method…

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