Featured patents

Wideband Optical Position Sensor With Normalization
US 08767219 B2, July 1, 2014, Position of detected arrangement relative to projected beam, Paul Edmond Rutten
A method for sensing the position of an incident optical beam in a plane…

Method for Detecting Particles and Defects and Inspection Equipment Thereof
US RE044840 E1, April 15, 2014, Detection of object or particle on surface, Takahiro Togashi et al. / Hitachi High-Technologies Corporation (Tokyo, JP)
An inspection apparatus which detects an anomaly of a substrate comprising;…

Simplified Checking Bench for Telescopes and Auto-Checkable Telescopes
US 08670113 B2, March 11, 2014, For optical transfer function, Hervé Benard et al. / Thales (Neuilly sur Seine, FR)
An optical checking bench for an optical instrument of telescope type,…

Absolute Distance Meter With Optical Switch
US 08659749 B2, Feb. 25, 2014, Having an alternating reference path, Robert E. Bridges / Faro Technologies, Inc. (Lake Mary, US)
An absolute distance meter that determines a distance to a target, comprising:…

Method and Device for Inspecting for Defects
US 08670116 B2, March 11, 2014, Surface condition, Toshifumi Honda et al. / Hitachi High-Technologies Corporation (Tokyo, JP)
A defect inspecting method comprising:…

System and Method for Efficient Coherence Anti-Stokes Raman Scattering Endoscopic and Intravascular Imaging and Multimodal Imaging
US 08582096 B2, Nov. 12, 2013, With Raman type light scattering, Gangjun Liu et al. / The Regents of the University of California (Oakland, US)
A method for using a fiber-based probe and/or fiber-based endoscope for coherent…

Image Calculation Method
US 08559009 B2, Oct. 15, 2013, Of surface reflection, Hiroshi Nomura et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A method of calculating an image for calculating an image to be imaged by…

Micro-Radian Class Line of Sight and Centration Stabilization System
US 08531657 B2, Sept. 10, 2013, Automatic following or aligning while indicating measurement, Frederick B. Koehler et al. / Raytheon Company (Waltham, US)
A laser projection system comprising:…

System and Method for in Situ Monitoring of Top Wafer Thickness in a Stack of Wafers
US 08520222 B2, Aug. 27, 2013, Thickness, Frederic Anthony Schraub et al. / Strasbaugh (San Luis Obispo, US)
A system for performing in situ thickness measurement of a wafer, or one or more…

Apparatus and Method for Observing the Surface of a Sample
US 08462356 B2, June 11, 2013, By focus detection, Sipke Wadman / Koninnklijke Philips Electronics N.V. (Eindhoven, NL)
An apparatus for observing the optical appearance of a surface of a sample…

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