Featured patents

Environmental System Including a Transport Region for an Immersion Lithography Apparatus
US 08830443 B2, Sept. 9, 2014, Step and repeat, Douglas C. Watson et al. / Nikon Corporation (Tokyo, JP)
A liquid immersion lithography apparatus comprising:…

Gradient Refractive Index Lens Array Projection Exposure
US 08797510 B2, Aug. 5, 2014, Methods, Hiroshi Kobayashi et al. / Tokyo Denki University (Tokyo, JP)
An apparatus comprising:…

EUV Reticle Substrates With High Thermal Conductivity
US 08736810 B2, May 27, 2014, Step and repeat, Ronald A. Wilklow et al. / ASML Holding N.V. (Veldhoven, NL)
A reticle, comprising:…

Fluid Handling Structure, Lithographic Apparatus and a Device Manufacturing Method
US 08638417 B2, Jan. 28, 2014, With temperature or foreign particle control, Clemens Johannes Gerardus Van Den Dungen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A fluid handling structure configured to supply immersion liquid to a space…

Wafer With Design Printed Outside Active Region and Spaced by Design Tolerance of Reticle Blind
US 08634063 B2, Jan. 21, 2014, Including shutter, diaphragm, polarizer or filter, Robert T. Froebel et al. / International Business Machines Corporation (Armonk, US)
A printed wafer, comprising:…

Constrained Optimization of Lithographic Source Intensities Under Contingent Requirements
US 08605254 B2, Dec. 10, 2013, Illumination systems or details, Kafai Lai et al. / International Business Machines Corporation (Armonk, US)
A method for illuminating a mask to project a desired image pattern…

Device for the Low-Deformation Replaceable Mounting of an Optical Element
US 08582081 B2, Nov. 12, 2013, Step and repeat, Dirk Schaffer et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An exposure apparatus, comprising:…

Exposure Apparatus and Device Manufacturing Method
US 08456609 B2, June 4, 2013, Step and repeat, Makoto Shibuta / Nikon Corporation (Tokyo, JP)
An exposure apparatus in which a substrate is exposed via a projection optical…

Lithographic Apparatus and Device Manufacturing Method
US 08462313 B2, June 11, 2013, Step and repeat, Ivo Adam Johannes Thomas et al. / ASML Netherlands B.V. (Veldhoven, NL)
An immersion lithographic apparatus comprising:…

Maintenance Method, Maintenance Device, Exposure Apparatus, and Device Manufacturing Method
US 08456608 B2, June 4, 2013, With temperature or foreign particle control, Tomoharu Fujiwara et al. / Nikon Corporation (Tokyo, JP)
A maintenance method comprising:…

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