Featured patents

Immersion Photolithography System and Method Using Microchannel Nozzles
US 08817230 B2, Aug. 26, 2014, With temperature or foreign particle control, Herman Vogel et al. / ASML Holding N.V. (Veldhoven, NL)
A device manufacturing method, comprising:…

Alignment Method, Alignment Apparatus, and Exposure Apparatus
US 08717544 B2, May 6, 2014, Contact Printing, Takamitsu Iwamoto / V Technology Co., Ltd. (Kanagawa, JP)
An alignment method for aligning a photomask with an object to be exposed having…

Gas Gauge Compatible With Vacuum Environments
US 08675168 B2, March 18, 2014, With temperature or foreign particle control, Geoffrey Alan Schultz / ASML Holding N.V. (Veldhoven, NL)
A lithography apparatus, comprising:…

Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method
US 08634062 B2, Jan. 21, 2014, Illumination systems or details, Uwe Mickan et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Exposure Apparatus and Device Manufacturing Method
US 08625073 B2, Jan. 7, 2014, Step and repeat, Ryota Makino et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus including an optical system having an illumination optical…

EUV Collector System With Enhanced EUV Radiation Collection
US 08587768 B2, Nov. 19, 2013, Including shutter, diaphragm, polarizer or filter, Gopal Vasudevan et al. / Media Lario S.R.L. (Bosisio Parini (LC), IT
A collector system for collecting and directing extreme ultraviolet (EUV)…

Mask Pattern Correction Device, Method of Correcting Mask Pattern, Light Exposure Correction Device, and Method of Correcting Light Exposure
US 08553198 B2, Oct. 8, 2013, Distortion introducing or rectifying, Morimi Osawa et al. / Fujitsu Semiconductor Limited (Yokohama, JP)
A mask pattern correction device used in pattern transfer, onto a target object…

Stage Base, Stage Apparatus, Exposure Apparatus, and Device Manufacturing Method
US 08547518 B2, Oct. 1, 2013, With temperature or foreign particle control, Kazuyuki Ono / Canon Kabushiki Kaisha (Tokyo, JP)
A stage apparatus comprising:…

Exposure Apparatus and Method for Manufacturing Device
US 08537331 B2, Sept. 17, 2013, Step and repeat, Hideaki Hara / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus comprising:…

Device Manufacturing Method, Lithographic Apparatus and a Computer Program
US 08477287 B2, July 2, 2013, Step and repeat, Roland Blok et al. / ASML Netherlands B.V. (Veldhoven, NL)
A device manufacturing method comprising exposing a substrate with a patterned…

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