Featured patents

Fluid Supply System, a Lithographic Apparatus, a Method of Varying Fluid Flow Rate and a Device Manufacturing Method
US 08848164 B2, Sept. 30, 2014, With temperature or foreign particle control, Nicolaas Ten Kate et al. / ASML Netherlands B.V. (Veldhoven, NL)
A fluid supply system for a lithographic apparatus, comprising:…

Lithographic Apparatus and Device Manufacturing Method of Applying a Pattern to a Substrate Using Sensor and Alignment Mark
US 08773637 B2, July 8, 2014, Focus or magnification control, Vasco Miguel Matias Serrao et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus arranged to transfer a pattern from a patterning device…

Stage Drive Method and Stage Unit, Exposure Apparatus, and Device Manufacturing Method
US 08724079 B2, May 13, 2014, Step and repeat, Yuichi Shibazaki / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate with an energy beam via…

Mirror for Guiding a Radiation Bundle
US 08717531 B2, May 6, 2014, With temperature or foreign particle control, Dieter Kraus et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An article, comprising:…

Surface Shape Measuring Apparatus, Exposure Apparatus, and Device Manufacturing Method
US 08564761 B2, Oct. 22, 2013, Including shutter, diaphragm, polarizer or filter, Hideki Ina et al. / Canon Kabushiki Kaisha (Tokyo, JP)
A surface shape measuring apparatus configured to measure a surface shape…

Exposure Apparatus and Device Fabrication Method
US 08531649 B2, Sept. 10, 2013, Including shutter, diaphragm, polarizer or filter, Shinichi Hirano et al. / Canon Kabushiki Kaisha JP
An exposure apparatus comprising:…

Fluid Handling Structure, Lithographic Apparatus and Device Manufacturing Method
US 08508712 B2, Aug. 13, 2013, With temperature or foreign particle control, Tijmen Wilfred Mathijs Gunther et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Movable Body System, Pattern Formation Apparatus, Exposure Apparatus and Exposure Method, and Device Manufacturing Method
US 08514373 B2, Aug. 20, 2013, Detailed holder for photosensitive paper, Yuichi Shibazaki / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate with an illumination beam via…

Projection Optical System, Exposure Apparatus, and Device Manufacturing Method
US 08477286 B2, July 2, 2013, Distortion introducing or rectifying, Yuhei Sumiyoshi / Canon Kabushiki Kaisha JP
A projection optical system configured to project an image of an object plane…

Substrate Holding Device, Lithography Apparatus Using Same, and Device Manufacturing Method
US 08472007 B2, June 25, 2013, Detailed holder for photosensitive paper, Masatoshi Endo / Canon Kabushiki Kaisha (Tokyo, JP)
A substrate holding device for holding a substrate, comprising:…

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