Featured patents

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08848166 B2, Sept. 30, 2014, Step and repeat, Michael Binnard / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus for exposing a substrate with an exposure beam…

Cooling Arrangement and Lithographic Apparatus Comprising a Resilient Wall Creating a Gap Between a Detector Module Housing and a Heat Sink of the Cooling Arrangement
US 08817228 B2, Aug. 26, 2014, With temperature or foreign particle control, Allard Eelco Kooiker et al. / ASML Netherland B.V. (Veldhoven, NL)
A cooling arrangement comprising:…

Exposure Apparatus, Structure, Method for Setting Up Apparatus, and Device Manufacturing Method Having Filling Member Formed by Hardening Liquid to Support Setting Leg
US 08780329 B2, July 15, 2014, Methods, Hiromichi Hara et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus configured to expose a pattern on an original…

Lithographic Apparatus and Device Manufacturing Method
US 08755030 B2, June 17, 2014, Focus or magnification control, Antonius Franciscus Johannes De Groot et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Stage Drive Method and Stage Unit, Exposure Apparatus, and Device Manufacturing Method
US 08705002 B2, April 22, 2014, Step and repeat, Yuichi Shibazaki / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate with an energy beam via…

Exposure Apparatus and Method for Producing Device
US 08692973 B2, April 8, 2014, With temperature or foreign particle control, Hiroyuki Nagasaka / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus arranged to project a pattern…

Maskless Exposure Apparatus and Control Method Thereof
US 08670107 B2, March 11, 2014, Illumination systems or details, Jeong Hyoun Sung / Samsung Electronics Co., Ltd. (Gyeonggi-do, KR)
A mask-less exposure apparatus comprising:…

Gas Manifold, Module for a Lithographic Apparatus, Lithographic Apparatus and Device Manufacturing Method
US 08675170 B2, March 18, 2014, With temperature or foreign particle control, Robin Bernardus Johannes Koldeweij et al. / ASML Netherlands B.V. (Veldhoven, NL)
A gas manifold to direct a gas flow between at least two parallel plates…

Heat Transfer Assembly, Lithographic Apparatus and Manufacturing Method
US 08502960 B2, Aug. 6, 2013, Detailed holder for photosensitive paper, Joannes Hendricus Maria Van Oers et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Optical System Having Heat Dissipation Arrangement
US 08456615 B2, June 4, 2013, Illumination systems or details, Hubert Holderer et al. / Carl Zeiss Laser Optics GmbH (Oberkochen, DE)
An optical system, comprising:…

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