Featured patents

Lithographic Apparatus and Device Manufacturing Method
US 08767171 B2, July 1, 2014, Step and repeat, Helmar Van Santen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising;…

Optical Element and Projection Exposure Apparatus Based on Use of the Optical Element
US 08767173 B2, July 1, 2014, Step and repeat, Takeshi Shirai / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus arranged to project a pattern…

Microlithographic Projection Exposure Apparatus With Correction Optical System That Heats Projection Objective Element
US 08773638 B2, July 8, 2014, Plural lamps, Arif Kazi et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An apparatus, comprising:…

Illumination System of a Microlithographic Projection Exposure Apparatus
US 08773639 B2, July 8, 2014, Including shutter, diaphragm, polarizer or filter, Markus Deguenther et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An illumination system having a beam path between a light source and a pupil…

Lithographic Apparatus and Device Manufacturing Method
US 08634058 B2, Jan. 21, 2014, Step and repeat, Paulus Martinus Maria Liebregts et al. / ASML Netherlands B.V. (Veldhoven, NL)
A device manufacturing method comprising:…

Optical System and Method for Characterising an Optical System
US 08625071 B2, Jan. 7, 2014, Step and repeat, Damian Fiolka / Carl Zeiss SMT GmbH (Oberkochen, DE)
An optical system having an optical axis, the optical system comprising:…

Lithographic Apparatus and Device Manufacturing Method
US 08547519 B2, Oct. 1, 2013, With temperature or foreign particle control, Hans Jansen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Apparatus and Device Manufacturing Method
US 08514365 B2, Aug. 20, 2013, With temperature or foreign particle control, Johannes Wilhelmus De Klerk et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus, comprising:…

Method of Determining a Characteristic
US 08502955 B2, Aug. 6, 2013, Step and repeat, Peter Clement Paul Vanoppen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method of determining a characteristic of features on a substrate, the method…

Movable Body Apparatus, Exposure Apparatus and Device Manufacturing Method
US 08472008 B2, June 25, 2013, Detailed holder for photosensitive paper, Go Ichinose / Nikon Corporation (Tokyo, JP)
A movable body apparatus, comprising:…

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