Featured patents

Environmental System Including Vacuum Scavenge for an Immersion Lithography Apparatus
US 08810768 B2, Aug. 19, 2014, With temperature or foreign particle control, Michael Sogard et al. / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus in which liquid is disposed between…

Optical Apparatus, and Method of Orienting a Reflective Element
US 08817232 B2, Aug. 26, 2014, Reflector between original and photo-sensitive paper, Gosse Charles De Vries et al.
An optical apparatus comprising a moveable reflective element and associated…

Reflective Film Interface to Restore Transverse Magnetic Wave Contrast in Lithographic Processing
US 08867024 B2, Oct. 21, 2014, Methods, Alan Rosenbluth et al. / International Business Machines Corporation (Armonk, US)
A system for exposing a resist layer with regions of photosensitivity to an image…

Lithographic Apparatus and Device Manufacturing Method
US 08767171 B2, July 1, 2014, Step and repeat, Helmar Van Santen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising;…

Exposure Apparatus, and Device Manufacturing Method
US 08717537 B2, May 6, 2014, Step and repeat, Akimitsu Ebihara / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate with an energy beam via…

Inspection Apparatus for Lithography
US 08681312 B2, March 25, 2014, Step and repeat, Alexander Straaijer / ASML Netherlands B.V. (Veldhoven, NL)
An inspection apparatus comprising:…

Optical System for Increasing Illumination Efficiency of a Patterning Device by Producing a Plurality of Beams
US 08634064 B2, Jan. 21, 2014, Including shutter, diaphragm, polarizer or filter, Stanislav Y. Smirnov / ASML Holding N.V. (Veldhoven, NL)
A lithography system, comprising:…

Imaging Optical System and Projection Exposure System for Microlithography
US 08576376 B2, Nov. 5, 2013, Reflector between original and photo-sensitive paper, Hans-Juergen Mann / Carl Zeiss SMT GmbH (Oberkochen, DE)
An imaging optical system which during operation directs light along a path…

Transmitting Optical Element and Objective for a Microlithographic Projection Exposure Apparatus
US 08570488 B2, Oct. 29, 2013, Illumination systems or details, Werner Mueller-Rissmann et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
A system, comprising:…

Alignment Method for Semiconductor Processing
US 08514374 B2, Aug. 20, 2013, Methods, William Chu et al. / International Business Machines Corporation (Armonk, US)
A method of providing improved alignment for a photolithographic exposure,…

Patentorg has 621 documents under Photocopying Patents.

Narrow down the browsing criteria below to see more patents.