Featured patents

Mask and Optical Filter Manufacturing Apparatus Including the Same
US 08810776 B2, Aug. 19, 2014, Including shutter, diaphragm, polarizer or filter, Bu Gon Shin et al. / LG Chem, Ltd. (Seoul, KR)
An optical filter manufacturing apparatus using a roll-to-roll process forming…

Environmental System Including Vacuum Scavenge for an Immersion Lithography Apparatus
US 08810768 B2, Aug. 19, 2014, With temperature or foreign particle control, Michael Sogard et al. / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus in which liquid is disposed between…

Programmable Illuminator for a Photolithography System
US 08823921 B2, Sept. 2, 2014, Illumination systems or details, Borislav Zlatanov et al. / Ultratech, Inc. (San Jose, US)
A photolithography system for illuminating over an optical path a reticle having…

Exposure Apparatus, Exposure Method, and Device Fabrication Method
US 08797506 B2, Aug. 5, 2014, Focus or magnification control, Motokatsu Imai et al. / Nikon Corporation (Tokyo, JP)
A liquid immersion exposure apparatus in which a substrate is exposed…

Exposure Apparatus, Structure, Method for Setting Up Apparatus, and Device Manufacturing Method Having Filling Member Formed by Hardening Liquid to Support Setting Leg
US 08780329 B2, July 15, 2014, Methods, Hiromichi Hara et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus configured to expose a pattern on an original…

Lithographic Apparatus and Device Manufacturing Method
US 08730448 B2, May 20, 2014, With temperature or foreign particle control, Nicolaas Ten Kate et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Exposure Apparatus, and Device Manufacturing Method
US 08717537 B2, May 6, 2014, Step and repeat, Akimitsu Ebihara / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate with an energy beam via…

Lithographic Apparatus Configured to Suppress Contamination From Passing Into the Projection System and Method
US 08625068 B2, Jan. 7, 2014, With temperature or foreign particle control, Han-Kwang Nienhuys et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

System for Patterning Flexible Foils
US 08570491 B2, Oct. 29, 2013, Detailed holder for photosensitive paper, Wilhelmus Johannes Maria de Laat et al. / Nederlandse Organisatie voor Toegepast-Natuurwetenschappelijk Onderzoek TNO (Delft, NL)
A table for compensating deformation in flexible foils, comprising…

Methodology for Implementing Enhanced Optical Lithography for Hole Patterning in Semiconductor Fabrication
US 08472005 B2, June 25, 2013, Illumination systems or details, Kuei Shun Chen et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A photolithography apparatus comprising:…

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