Featured patents

Illumination System for Microlithography
US 08792082 B2, July 29, 2014, Illumination systems or details, Markus Brotsack / Carl Zeiss SMT GmbH (Oberkochen, DE)
An illumination system for a microlithography projection exposure apparatus…

Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell
US 08767183 B2, July 1, 2014, Methods, Arie Jeffrey Den Boef / ASML Netherlands B.V. (Veldhoven, NL)
A method comprising:…

Exposure Apparatus and Method of Manufacturing Device
US 08749758 B2, June 10, 2014, Distortion introducing or rectifying, Kentarou Kawanami / Canon Kabushiki Kaisha JP
An exposure apparatus which projects an image of a pattern of an original…

Lithographic Apparatus and Device Manufacturing Method
US 08724084 B2, May 13, 2014, Step and repeat, Johannes Catharinus Hubertus Mulkens et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic projection apparatus arranged to project a patterned radiation…

Calibration of Optical Line Shortening Measurements
US 08717539 B2, May 6, 2014, Illumination systems or details, David Ziger / Infineon Technologies AG (Neubiberg, DE)
A system for calibration of line shortening measurements, the system comprising:…

Exposure Apparatus, and Device Manufacturing Method
US 08692976 B2, April 8, 2014, Step and repeat, Akimitsu Ebihara / Nikon Corporation (Tokyo, JP)
An exposure apparatus that exposes a substrate via a projection optical system…

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08634057 B2, Jan. 21, 2014, With temperature or foreign particle control, Michael Binnard / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus for exposing a substrate with an exposure beam…

Lithographic Apparatus Configured to Suppress Contamination From Passing Into the Projection System and Method
US 08625068 B2, Jan. 7, 2014, With temperature or foreign particle control, Han-Kwang Nienhuys et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Method for Operating an Illumination System of a Microlithographic Projection Exposure Apparatus
US 08467033 B2, June 18, 2013, Illumination systems or details, Frank Schlesener et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
A method, comprising: a)…

Exposure Apparatus, Method for Producing Device, and Method for Controlling Exposure Apparatus
US 08451424 B2, May 28, 2013, Step and repeat, Hisatsune Kadota et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus which exposes a substrate by radiating an exposure light…

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