Featured patents

Exposure Apparatus, Exposure Method, and Blind for Exposure Apparatus
US 08842258 B2, Sept. 23, 2014, Including shutter, diaphragm, polarizer or filter, Bo-Kyoung Ahn et al. / Samsung Display Co., Ltd. KR
An exposure apparatus comprising:…

Coating and Developing Apparatus and Method, and Storage Medium
US 08817225 B2, Aug. 26, 2014, With developing, Suguru Enokida et al. / Tokyo Electron Limited (Minato-Ku, JP)
A coating and developing apparatus comprising a carrier block, a processing…

Immersion Lithographic Apparatus and Method for Rinsing Immersion Space Before Exposure
US 08704997 B2, April 22, 2014, With temperature or foreign particle control, Kenichi Shiraishi / Nikon Corporation (Tokyo, JP)
A cleaning method for an immersion type projection apparatus, the apparatus…

Stage Device and Coordinate Correction Method for the Same, Exposure Apparatus, and Device Manufacturing Method
US 08681314 B2, March 25, 2014, Detailed holder for photosensitive paper, Masato Takahashi et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus that transfers a predetermined pattern onto a substrate,…

Spectral Purity Filter and Lithographic Apparatus
US 08665420 B2, March 4, 2014, Including shutter, diaphragm, polarizer or filter, Maarten Marinus Johannes Wilhelmus Van Herpen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A spectral purity filter configured to reflect extreme ultraviolet radiation,…

Lithographic Apparatus, Projection System and Damper for Use in a Lithographic Apparatus and Device Manufacturing Method
US 08625070 B2, Jan. 7, 2014, Step and repeat, Windy Lynn Farnsworth et al. / ASML Holding N.V. (Veldhoven, NL)
A projection system, comprising:…

Projection Objective for Microlithography
US 08553202 B2, Oct. 8, 2013, Illumination systems or details, Tilman Schwertner et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An optical system, comprising:…

Measuring Apparatus and Projection Exposure Apparatus Having the Same
US 08537334 B2, Sept. 17, 2013, Focus or magnification control, Takahiro Matsumoto / Canon Kabushiki Kaisha (Tokyo, JP)
A measuring apparatus that measures a substrate on which a line mark is formed…

Movable Body Drive Method and Movable Body Drive System, Pattern Formation Method and Pattern Formation Apparatus, and Device Manufacturing Method
US 08547527 B2, Oct. 1, 2013, Detailed holder for photosensitive paper, Yuho Kanaya / Nikon Corporation (Tokyo, JP)
A movable body drive method of driving a movable body along a predetermined…

Exposure Method and Exposure Apparatus
US 08497979 B2, July 30, 2013, Including shutter, diaphragm, polarizer or filter, Koichi Kajiyama / V Technology Co., Ltd. (Yokohama-shi, JP)
An exposure method for forming a different exposure pattern on each…

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