Featured patents

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08848166 B2, Sept. 30, 2014, Step and repeat, Michael Binnard / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus for exposing a substrate with an exposure beam…

Exposure Apparatus, Method for Cleaning Member Thereof, Maintenance Method for Exposure Apparatus, Maintenance Device, and Method for Producing Device
US 08810767 B2, Aug. 19, 2014, With temperature or foreign particle control, Kenichi Shiraishi et al. / Nikon Corporation (Tokyo, JP)
A liquid immersion lithography apparatus comprising:…

Exposure Apparatus With an Illumination System Generating Multiple Illumination Beams
US 08736813 B2, May 27, 2014, Illumination systems or details, Daniel Gene Smith et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus for transferring a mask pattern from a mask surface…

Digital Stereo Imaging Photosensitive Device for a Grating and a Photosensitive Material and Its Method
US 08705011 B2, April 22, 2014, Step and repeat, Jinchang Gu
A digital stereo imaging photosensitive device for a grating and a photosensitive…

Lithographic Apparatus and Device Manufacturing Method
US 08681311 B2, March 25, 2014, With temperature or foreign particle control, Michel Riepen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A device manufacturing method comprising:…

Optical Component for Maskless Exposure Apparatus
US 08629974 B2, Jan. 14, 2014, Including shutter, diaphragm, polarizer or filter, Jin Ho Jung
An optical component for a maskless exposure apparatus comprising:…

Determining Lithographic Set Point Using Optical Proximity Correction Verification Simulation
US 08619236 B2, Dec. 31, 2013, Methods, James A. Bruce et al. / International Business Machines Corporation (Armonk, US)
A computer-implemented method of determining a lithographic tool set point…

System for Patterning Flexible Foils
US 08570491 B2, Oct. 29, 2013, Detailed holder for photosensitive paper, Wilhelmus Johannes Maria de Laat et al. / Nederlandse Organisatie voor Toegepast-Natuurwetenschappelijk Onderzoek TNO (Delft, NL)
A table for compensating deformation in flexible foils, comprising…

Lithographic Apparatus and Device Manufacturing Method
US 08570486 B2, Oct. 29, 2013, With temperature or foreign particle control, Johannes Jacobus Matheus Baselmans et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic projection apparatus, comprising:…

Illumination Optimization
US 08542340 B2, Sept. 24, 2013, Distortion introducing or rectifying, Hanying Feng et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method of improving an illumination pupil shape for an illumination source used…

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