Featured patents

Method and Device for Producing Contact Copies
US 08810766 B2, Aug. 19, 2014, Hologram, Seismogram, Graph or Scale Copying, Günther Dausmann / Hologram Industries Research GmbH (Pliening-Ottersberg, DE)
Method for producing contact copies of reflection volume holograms…

Method of Cooling an Optical Element, Lithographic Apparatus and Method for Manufacturing a Device
US 08817229 B2, Aug. 26, 2014, With temperature or foreign particle control, Erik Roelof Loopstra et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method of thermally conditioning an optical element operating in a vacuum…

Lithographic Apparatus and Device Manufacturing Method
US 08780321 B2, July 15, 2014, With temperature or foreign particle control, David Lucien Anstotz et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Apparatus, Fluid Handling Structure for Use in a Lithographic Apparatus and Device Manufacturing Method
US 08767169 B2, July 1, 2014, With temperature or foreign particle control, Niek Jacobus Johannes Roset et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Method to Apply a Pattern to a Substrate and Lithographic Apparatus
US 08760620 B2, June 24, 2014, Distortion introducing or rectifying, Haico Victor Kok / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic method to apply a pattern to a substrate comprising:…

Exposure Apparatus and Method of Manufacturing Device
US 08760630 B2, June 24, 2014, Detailed holder for photosensitive paper, Yasuyuki Tamura et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus which projects a pattern of an original onto a substrate…

Measurement Apparatus, Exposure Apparatus, and Device Fabrication Method
US 08692975 B2, April 8, 2014, Step and repeat, Yoshiyuki Kuramoto / Canon Kabushiki Kaisha JP
A measurement apparatus which measures an imaging performance of an optical…

Electromagnetic Actuator, Stage Apparatus and Lithographic Apparatus
US 08687171 B2, April 1, 2014, Detailed holder for photosensitive paper, Wei Zhou et al. / ASML Netherlands B.V. (Veldhoven, NE)
An electromagnetic actuator comprising:…

Method for a Multiple Exposure, Microlithography Projection Exposure Installation and a Projection System
US 08634060 B2, Jan. 21, 2014, Step and repeat, Ralf Scharnweber / Carl Zeiss SMT GmbH (Oberkochen, DE)
A microlithography projection exposure installation, comprising:…

Exposure Method and Lithography System
US 08605248 B2, Dec. 10, 2013, Distortion introducing or rectifying, Masaharu Kawakubo / Nikon Corporation (Tokyo, JP)
An exposure method in which overlay exposure to a photosensitive object is…

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