Featured patents

Lithographic Apparatus and Method
US 08830444 B2, Sept. 9, 2014, Step and repeat, Igor Petrus Maria Bouchoms et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Apparatus and Method Involving a Pockels Cell
US 08817235 B2, Aug. 26, 2014, Including shutter, diaphragm, polarizer or filter, Johannes Jacobus Matheus Baselmans et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Exposure Apparatus and Device Fabrication Method
US 08810774 B2, Aug. 19, 2014, Focus or magnification control, Ryo Sasaki et al. / Canon Kabushiki Kaisha JP
An exposure apparatus comprising:…

Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations From a First Object to a Second Object
US 08743344 B2, June 3, 2014, Methods, Martinus Van Duijnhoven et al. / ASML Netherlands B.V. (Veldhoven, NL)
A control system configured to control a position of a cable bundle holder…

Lithographic Apparatus and Device Manufacturing Method
US 08675173 B2, March 18, 2014, Step and repeat, Paulus Martinus Maria Liebregts et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic projection apparatus, comprising:…

Nanometer-Precision Six-Degree-Of-Freedom Magnetic Suspension Micro-Motion Table and Application Thereof
US 08599361 B2, Dec. 3, 2013, Detailed holder for original, Guang Li et al. / Tsinghua University (Beijing, CN)
A nanometer precision six-DOF magnetic suspension micro-stage, characterized by…

Optical Member-Holding Apparatus, Method for Adjusting Position of Optical Member, and Exposure Apparatus
US 08576375 B2, Nov. 5, 2013, Reflector between original and photo-sensitive paper, Jin Nishikawa / Nikon Corporation (Tokyo, JP)
An optical member-holding apparatus which holds a plurality of optical members…

Exposing Method, Exposure Apparatus, and Device Fabricating Method
US 08547520 B2, Oct. 1, 2013, With temperature or foreign particle control, Yosuke Shirata / Nikon Corporation (Tokyo, JP)
An exposing method that exposes a substrate via a liquid, comprising:…

Lithographic Apparatus and Device Manufacturing Method
US 08472006 B2, June 25, 2013, Illumination systems or details, Bob Streefkerk et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Particle Cleaning of Optical Elements for Microlithography
US 08477285 B2, July 2, 2013, With temperature or foreign particle control, Almut Czap et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
Optical assembly mounted in a projection exposure apparatus…

Patentorg has 621 documents under Photocopying Patents.

Narrow down the browsing criteria below to see more patents.