Featured patents

Criss-Cross Writing Strategy
US 08767185 B2, July 1, 2014, Methods, Torbjörn Sandström / Micronic Laser Systems AB (Taby, SE)
A method of writing a microlithographic pattern onto a workpiece, including:…

Lithographic Apparatus and Surface Cleaning Method
US 08760616 B2, June 24, 2014, With temperature or foreign particle control, Takeshi Kaneko et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Apparatus and Device Manufacturing Method
US 08730448 B2, May 20, 2014, With temperature or foreign particle control, Nicolaas Ten Kate et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Immersion Lithographic Apparatus and Method for Rinsing Immersion Space Before Exposure
US 08704997 B2, April 22, 2014, With temperature or foreign particle control, Kenichi Shiraishi / Nikon Corporation (Tokyo, JP)
A cleaning method for an immersion type projection apparatus, the apparatus…

Active Drying Station and Method to Remove Immersion Liquid Using Gas Flow Supply With Gas Outlet Between Two Gas Inlets
US 08638415 B2, Jan. 28, 2014, With temperature or foreign particle control, Johannes Catharinus Hubertus Mulkens et al. / ASML Netherlands B.V. (Veldhoven, NL)
A device manufacturing method comprising:…

Lithographic Apparatus and Method
US 08610878 B2, Dec. 17, 2013, Detailed holder for photosensitive paper, Patrick Marcel Maria Thomassen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus, comprising:…

Exposure Apparatus and Method of Decreasing Fluctuations in Optical Characteristics of Projection System
US 08564758 B2, Oct. 22, 2013, Distortion introducing or rectifying, Atsushi Shigenobu et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus comprising:…

Method and Apparatus for Printing Periodic Patterns
US 08525973 B2, Sept. 3, 2013, Methods, Harun H. Solak et al. / Eulitha A.G. (Villigen, CH)
A method for printing a pattern of features, including the steps of:…

Position Measurement Using Natural Frequency Vibration of a Pattern
US 08477289 B2, July 2, 2013, Methods, Igor Matheus Petronella Aarts et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method for measuring a property of an extended pattern formed by one or more…

Illumination Optical System, Exposure Apparatus, Optical Element and Manufacturing Method Thereof, and Device Manufacturing Method
US 08451427 B2, May 28, 2013, Illumination systems or details, Osamu Tanitsu / Nikon Corporation (Tokyo, JP)
An illumination optical system which illuminates a target surface with light…

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