Featured patents

Lithographic Apparatus Having an Encoder Type Position Sensor System
US 08836913 B2, Sept. 16, 2014, With temperature or foreign particle control, Wilhelmus Josephus Box et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus, comprising:…

Inspection Method and Apparatus
US 08773640 B2, July 8, 2014, Detailed holder for photosensitive paper, Sander Kerssemakers et al. / ASML Netherlands B.V. (Veldhoven, NL)
An inspection apparatus configured to measure a property of a substrate,…

Movable Body Apparatus, Exposure Apparatus and Optical System Unit, and Device Manufacturing Method
US 08749753 B2, June 10, 2014, With temperature or foreign particle control, Keiichi Tanaka et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus which irradiates an energy beam on an object via an optical…

Exposure Apparatus, Exposure Method, and Method for Producing Device
US 08736809 B2, May 27, 2014, Step and repeat, Soichi Owa et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus comprising:…

EUV Radiation Source and Method of Generating EUV Radiation
US 08730454 B2, May 20, 2014, Illumination systems or details, Michel François Hubert Klaassen / ASML Netherlands B.V. (Veldhoven, NL)
An extreme ultraviolet (EUV) radiation source, comprising:…

Fluid Handling Structure, a Lithographic Apparatus and a Device Manufacturing Method
US 08711326 B2, April 29, 2014, With temperature or foreign particle control, Ronald Van Der Ham et al. / ASML Netherlands B.V. (Veldhoven, NL)
A fluid handling structure to confine immersion liquid in a space between…

Device and Method for Drying a Photomask
US 08724078 B2, May 13, 2014, With temperature or foreign particle control, Cindy Thovex et al. / Adixen Vacuum Products (Annecy, FR)
A device for drying a photomask, the device comprising:…

Method for Damping an Object, an Active Damping System, and a Lithographic Apparatus
US 08619232 B2, Dec. 31, 2013, Illumination systems or details, Hans Butler et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method for damping motion of an object in two or more degrees of freedom…

Homogenizer
US 08508716 B2, Aug. 13, 2013, Illumination systems or details, Herman Philip Godfried et al. / ASML Netherlands B.V. (Veldhoven, NL)
A two-stage homogenizer comprising:…

Exposure Method and Exposure Apparatus
US 08497979 B2, July 30, 2013, Including shutter, diaphragm, polarizer or filter, Koichi Kajiyama / V Technology Co., Ltd. (Yokohama-shi, JP)
An exposure method for forming a different exposure pattern on each…

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