Featured patents

Illumination Optical System, Exposure Apparatus, and Device Fabrication Method
US 08854605 B2, Oct. 7, 2014, Including shutter, diaphragm, polarizer or filter, Ken Minoda / Canon Kabushiki Kaisha JP
An illumination optical system for illuminating an illumination target surface…

Exposure Apparatus, Exposure Method, and Device Manufacturing Method
US 08786829 B2, July 22, 2014, Detailed holder for photosensitive paper, Yuho Kanaya / Nikon Corporation (Tokyo, JP)
An exposure apparatus comprising:…

Fluid Handling Structure, Lithographic Apparatus and Device Manufacturing Method
US 08780324 B2, July 15, 2014, With temperature or foreign particle control, Michel Riepen et al. / ASML Netherlands B.V. (Veldhoven, NL)
A fluid handling structure for a lithographic apparatus, the fluid handling…

Microlithographic Projection Exposure Apparatus With Correction Optical System That Heats Projection Objective Element
US 08773638 B2, July 8, 2014, Plural lamps, Arif Kazi et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An apparatus, comprising:…

Lithographic Apparatus and Device Manufacturing Method
US 08724083 B2, May 13, 2014, Step and repeat, Bob Streefkerk et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Diffraction Elements for Alignment Targets
US 08681313 B2, March 25, 2014, Including photocell or phototube, Muhammad Arif et al. / ASML Holding N.V. (Veldhoven, NL)
A lithographic apparatus for use with a reflective patterning device,…

Exposure Apparatus and Method of Manufacturing Device
US 08665416 B2, March 4, 2014, Step and repeat, Tsutomu Takenaka / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus which exposes a substrate to a pattern of an original,…

Exposure Apparatus, Exposure Method, and Method of Manufacturing Device
US 08625072 B2, Jan. 7, 2014, Step and repeat, Takanori Sato / Canon Kabushiki Kaisha JP
An exposure apparatus which projects a pattern of a reticle onto a substrate via…

Optical Imaging Device With Image Defect Determination
US 08537333 B2, Sept. 17, 2013, Step and repeat, Ulrich Wegmann et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
Optical imaging device, comprising:…

Substrate Measurement Method and Apparatus
US 08497976 B2, July 30, 2013, Illumination systems or details, Everhardus Cornelis Mos et al. / ASML Netherlands B.V. (Veldhoven, NL)
A measurement apparatus for obtaining a characteristic of a substrate,…

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