Featured patents

Alignment Method for Semiconductor Processing
US 08514374 B2, Aug. 20, 2013, William Chu et al. / International Business Machines Corporation (Armonk, US)
A method of providing improved alignment for a photolithographic exposure,…

Asymmetric Complementary Dipole Illuminator
US 08736816 B2, May 27, 2014, Azalia A. Krasnoperova / International Business Machines Corporation (Armonk, US)
A method of designing an asymmetrical complementary dipole element, comprising:…

Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations From a First Object to a Second Object
US 08743344 B2, June 3, 2014, Martinus Van Duijnhoven et al. / ASML Netherlands B.V. (Veldhoven, NL)
A control system configured to control a position of a cable bundle holder…

Computer Readable Storage Medium Including Effective Light Source Calculation Program, and Exposure Method
US 08502962 B2, Aug. 6, 2013, Kenji Yamazoe et al. / Canon Kabushiki Kaisha JP
A non-transitory computer readable storage medium storing a program executable by…

Criss-Cross Writing Strategy
US 08767185 B2, July 1, 2014, Torbjörn Sandström / Micronic Laser Systems AB (Taby, SE)
A method of writing a microlithographic pattern onto a workpiece, including:…

Determining Lithographic Set Point Using Optical Proximity Correction Verification Simulation
US 08619236 B2, Dec. 31, 2013, James A. Bruce et al. / International Business Machines Corporation (Armonk, US)
A computer-implemented method of determining a lithographic tool set point…

Evaluation Method, Control Method, Exposure Apparatus, and Memory Medium
US 08520190 B2, Aug. 27, 2013, Tadashi Arai / Canon Kabushiki Kaisha (Tokyo, JP)
A method of evaluating an imaging performance of a projection optical system…

Exposing Method and Method of Manufacturing Semiconductor Device
US 08654313 B2, Feb. 18, 2014, Takamasa Takaki et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
An exposing method comprising:…

Exposure Apparatus, Structure, Method for Setting Up Apparatus, and Device Manufacturing Method Having Filling Member Formed by Hardening Liquid to Support Setting Leg
US 08780329 B2, July 15, 2014, Hiromichi Hara et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus configured to expose a pattern on an original…

Exposure Method, Exposure Apparatus, and Device Manufacturing Method
US 08488109 B2, July 16, 2013, Yuichi Shibazaki / Nikon Corporation (Tokyo, JP)
An exposure method in which a pattern is sequentially formed on a plurality…

Exposure Method, Exposure Apparatus, and Method for Producing Device
US 08488108 B2, July 16, 2013, Hiroyuki Nagaksaka / Nikon Corporation (Tokyo, JP)
A method for forming a liquid immersion area with a liquid on an object…

Exposure Method, Exposure Apparatus, and Method of Manufacturing Device
US 08502961 B2, Aug. 6, 2013, Kentarou Kawanami / Canon Kabushiki Kaisha JP
An exposure method of illuminating a mask, on which a pattern is formed, using…

Exposure Method, Exposure Apparatus, Method for Producing Device, and Method for Evaluating Exposure Apparatus
US 08638422 B2, Jan. 28, 2014, Kenichi Shiraishi / Nikon Corporation (Tokyo, JP)
An evaluation method for evaluating control accuracy of an exposure apparatus…

Gradient Refractive Index Lens Array Projection Exposure
US 08797510 B2, Aug. 5, 2014, Hiroshi Kobayashi et al. / Tokyo Denki University (Tokyo, JP)
An apparatus comprising:…

Illumination Design for Lens Heating Mitigation
US 08625078 B2, Jan. 7, 2014, Kaveri Jain et al. / Nanya Technology Corp. (Kueishan, Tao-Yuan Hsien, TW)
A method for increasing image performance of a lens used in an imaging procedure…

Lithographic Apparatus Having a Feed Forward Pressure Pulse Compensation for the Metrology Frame
US 08493553 B2, July 23, 2013, Marc Wilhelmus Maria Van Der Wijst et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Apparatus, Computer Program Product and Device Manufacturing Method
US 08860928 B2, Oct. 14, 2014, Bearrach Moest et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Lithographic Method and Arrangement for Manufacturing a Spacer
US 08786833 B2, July 22, 2014, Remco Jochem Sebastiaan Groenendijk et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic method comprising:…

Management Method and System for Exposure Apparatus Having Alarm Based on Inclination Amount and Deviation From Aligned Position
US 08836919 B2, Sept. 16, 2014, Akira Ogawa et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A control method for an exposure apparatus, comprising:…

Maskless Exposure Apparatus and Method of Alignment for Overlay in Maskless Exposure
US 08675180 B2, March 18, 2014, Ho Seok Choi et al. / Samsung Electronics Co., Ltd. (Gyeonggi-Do, KR)
A maskless exposure device comprising:…

Maskless Exposure Apparatus and Method to Determine Exposure Start Position and Orientation in Maskless Lithography
US 08755034 B2, June 17, 2014, Sung Min Ahn et al. / Samsung Electronics Co., Ltd KR
A method to determine an exposure start position and orientation comprising:…

Measurement System, Method and Lithographic Apparatus
US 08681316 B2, March 25, 2014, Henrikus Herman Marie Cox et al. / ASML Netherlands B.V. (Veldhoven, NL)
A measurement system configured to derive a position quantity of an object,…

Method and Apparatus for Printing Periodic Patterns
US 08525973 B2, Sept. 3, 2013, Harun H. Solak et al. / Eulitha A.G. (Villigen, CH)
A method for printing a pattern of features, including the steps of:…

Method and System for Calibrating Exposure System for Manufacturing of Integrated Circuits
US 08804100 B2, Aug. 12, 2014, Cher Huan Tan et al. / Semiconductor Manufacturing International (Shanghai) Corporation (Shanghai, CN
A method for determining one or more focus parameters for an exposure system,…

Method for Determining Exposure Condition and Computer-Readable Storage Media Storing Program for Determining Exposure Condition
US 08867023 B2, Oct. 21, 2014, Kouichirou Tsujita / Canon Kabushiki Kaisha (Tokyo, JP)
A method for determining a pattern of an original for use in projecting an image…

Method for Determining Illumination Source With Optimized Depth of Focus
US 08699003 B2, April 15, 2014, Chun-Wei Wu / Nanya Technology Corp. (Kueishan, Tao-Yuan Hsien, TW)
A method for determining an illumination source with optimized depth of focus,…

Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell
US 08767183 B2, July 1, 2014, Arie Jeffrey Den Boef / ASML Netherlands B.V. (Veldhoven, NL)
A method comprising:…

Movable Body Drive Method and Movable Body Drive System, Pattern Formation Method and Apparatus, Exposure Method and Apparatus, Position Control Method and Position Control System, and Device Manufacturing Method
US 08582084 B2, Nov. 12, 2013, Yuho Kanaya et al. / Nikon Corporation (Tokyo, JP)
A movable body drive method in which a movable body is driven at least…

Optical Nanolithography System and Method Using a Tilting Transparent Medium
US 08767184 B2, July 1, 2014, Zahra Kolahdouz Esfahani et al.
A method for optical nanolithography, comprising:…

Optical System With an Exchangeable, Manipulable Correction Arrangement for Reducing Image Aberrations
US 08542346 B2, Sept. 24, 2013, Stefan Hembacher et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An optical system, comprising:…

Patentorg has 33 documents under Methods Patents.