Featured patents

Laser Irradiation Device and Method of Manufacturing Organic Light Emitting Diode Display Device Using the Same
US 08699002 B2, April 15, 2014, Do-Young Kim et al. / Samsung Display Co., Ltd. (Giheung-Gu, Yongin, Gyeonggi-Do, KR)
A laser irradiation device, comprising:…

Nanometer-Precision Six-Degree-Of-Freedom Magnetic Suspension Micro-Motion Table and Application Thereof
US 08599361 B2, Dec. 3, 2013, Guang Li et al. / Tsinghua University (Beijing, CN)
A nanometer precision six-DOF magnetic suspension micro-stage, characterized by…

Optically Compensated Unidirectional Reticle Bender
US 08553207 B2, Oct. 8, 2013, Santiago E. Del Puerto / ASML Holdings N.V. (Veldhoven, NL)
A lithographic apparatus including a patterning device handler, comprising:…

Pellicle Frame and Lithographic Pellicle
US 08467035 B2, June 18, 2013, Grace Ng et al. / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A pellicle frame comprising a pellicle frame bar having a cross-section…

Reflective Reticle Chuck, Reflective Illumination System Including the Same, Method of Controlling Flatness of Reflective Reticle Using the Chuck, and Method of Manufacturing Semiconductor Device Using the Chuck
US 08599360 B2, Dec. 3, 2013, In-Sung Kim et al. / Samsung Electronics Co., Ltd. (Suwon-si, Gyeonggi-do, KR)
A reflective reticle chuck, comprising:…

Scanning Exposure Apparatus, Control Apparatus and Method of Manufacturing Device
US 08493551 B2, July 23, 2013, Mitsuo Hirata et al. / Canon Kabushiki Kaisha JP
A scanning exposure apparatus which performs an exposure of a substrate…

System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
US 08446570 B2, May 21, 2013, Woodrow J. Olsen et al. / ASML Holding N.V. (Veldhoven, NL)
A substantially gas-tight box, comprising:…

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