Featured patents

1.5D SLM for Lithography
US 08767175 B2, July 1, 2014, Torbjörn Sandström / Micronic Laser Systems AB (Taby, SE)
A microlithographic system that exposes a radiation sensitive layer…

Actuator System Using Multiple Piezoelectric Actuators
US 08446562 B2, May 21, 2013, Fred Joseph Scipione et al. / ASML Holding N.V. (Veldhoven, NL)
A system for positioning an optical element within an optical device, comprising:…

Apparatus and Method for Immersion Lithography
US 08564759 B2, Oct. 22, 2013, Ching-Yu Chang et al. / Taiwan Semiconductor Manufacturing Company, Ltd. (Hsin-Chu, TW)
A lithography apparatus, comprising:…

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08514367 B2, Aug. 20, 2013, Michael Binnard / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus comprising:…

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08848166 B2, Sept. 30, 2014, Michael Binnard / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus for exposing a substrate with an exposure beam…

Apparatus and Method for Maintaining Immersion Fluid in the Gap Under the Projection Lens During Wafer Exchange in an Immersion Lithography Machine
US 08610875 B2, Dec. 17, 2013, Michael Binnard / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus for exposing a substrate with an exposure beam…

Apparatus and Method for Providing Fluid for Immersion Lithography
US 08520187 B2, Aug. 27, 2013, Alex Ka Tim Poon et al. / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus that projects a pattern from a patterning…

Apparatus and Methods for Keeping Immersion Fluid Adjacent to an Optical Assembly During Wafer Exchange in an Immersion Lithography Machine
US 08743343 B2, June 3, 2014, Leonard Wai Fung Kho et al. / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus comprising:…

Apparatus for and Method of Wafer Edge Exposure
US 08804096 B2, Aug. 12, 2014, Chin Cheng Yang / Macronix International Co., Ltd. (Hsin-Chu, TW)
An apparatus for wafer edge exposure comprising:…

Dedicated Metrology Stage for Lithography Applications
US 08547522 B2, Oct. 1, 2013, Marcus Adrianus Van De Kerkhof et al. / ASML Netherlands B.V. (Veldhoven, NL)
A method of measuring optical parameters of an exposure portion of a lithography…

Detection Apparatus, Exposure Apparatus, and Device Fabrication Method
US 08659743 B2, Feb. 25, 2014, Kazuhiko Mishima / Canon Kabushiki Kaisha JP
A detection apparatus for detecting an upper-surface mark and a lower-surface…

Device for the Low-Deformation Replaceable Mounting of an Optical Element
US 08582081 B2, Nov. 12, 2013, Dirk Schaffer et al. / Carl Zeiss SMT GmbH (Oberkochen, DE)
An exposure apparatus, comprising:…

Device Manufacturing Method, Lithographic Apparatus and a Computer Program
US 08477287 B2, July 2, 2013, Roland Blok et al. / ASML Netherlands B.V. (Veldhoven, NL)
A device manufacturing method comprising exposing a substrate with a patterned…

Dual Stage Lithographic Apparatus and Device Manufacturing Method
US RE044446 E1, Aug. 20, 2013, Erik Roelof Loopstra et al. / ASML Netherlands B.V. (Veldhoven, NL)
A lithographic apparatus comprising:…

Environmental System Including a Transport Region for an Immersion Lithography Apparatus
US 08830443 B2, Sept. 9, 2014, Douglas C. Watson et al. / Nikon Corporation (Tokyo, JP)
A liquid immersion lithography apparatus comprising:…

Environmental System Including Vacuum Scavenge for an Immersion Lithography Apparatus
US 08456610 B2, June 4, 2013, Michael Sogard et al. / Nikon Corporation (Tokyo, JP)
A liquid containment system used for a liquid immersion lithography apparatus…

EUV Reticle Substrates With High Thermal Conductivity
US 08736810 B2, May 27, 2014, Ronald A. Wilklow et al. / ASML Holding N.V. (Veldhoven, NL)
A reticle, comprising:…

Exposure Apparatus
US 08830446 B2, Sept. 9, 2014, Timotheus Franciscus Sengers et al. / ASML Netherlands B.V. (Veldhoven, NL)
An extreme ultraviolet exposure apparatus comprising:…

Exposure Apparatus
US 08542341 B2, Sept. 24, 2013, Carolus Ida Maria Antonius Spee et al. / ASML Netherlands B.V. (Veldhoven, NL)
An exposure apparatus comprising:…

Exposure Apparatus and Device Fabrication Method
US 08558987 B2, Oct. 15, 2013, Masaomi Kameyama / Nikon Corporation (Tokyo, JP)
An immersion lithography system comprising:…

Exposure Apparatus and Device Manufacturing Method
US 08797505 B2, Aug. 5, 2014, Takeshi Okuyama et al. / Nikon Corporation (Tokyo, JP)
A liquid immersion exposure apparatus that exposes a substrate, the apparatus…

Exposure Apparatus and Device Manufacturing Method
US 08625073 B2, Jan. 7, 2014, Ryota Makino et al. / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus including an optical system having an illumination optical…

Exposure Apparatus and Device Manufacturing Method
US 08456609 B2, June 4, 2013, Makoto Shibuta / Nikon Corporation (Tokyo, JP)
An exposure apparatus in which a substrate is exposed via a projection optical…

Exposure Apparatus and Electronic Device Manufacturing Method
US 08467032 B2, June 18, 2013, Hideki Komatsuda / Nikon Corporation (Tokyo, JP)
An exposure apparatus comprising:…

Exposure Apparatus and Method for Manufacturing Device
US 08537331 B2, Sept. 17, 2013, Hideaki Hara / Nikon Corporation (Tokyo, JP)
An immersion exposure apparatus comprising:…

Exposure Apparatus and Method for Producing Device
US 08780327 B2, July 15, 2014, Katsushi Nakano et al. / Nikon Corporation (Tokyo, JP)
An exposure apparatus comprising:…

Exposure Apparatus and Method of Manufacturing Device
US 08665416 B2, March 4, 2014, Tsutomu Takenaka / Canon Kabushiki Kaisha (Tokyo, JP)
An exposure apparatus which exposes a substrate to a pattern of an original,…

Exposure Apparatus and Photomask
US 08854600 B2, Oct. 7, 2014, Michinobu Mizumura / V Technology Co., Ltd. (Yokohama-shi, JP)
An exposure apparatus, comprising:…

Exposure Apparatus, and Device Manufacturing Method
US 08830445 B2, Sept. 9, 2014, Akimitsu Ebihara / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus comprising:…

Exposure Apparatus, and Device Manufacturing Method
US 08767177 B2, July 1, 2014, Akimitsu Ebihara / Nikon Corporation (Tokyo, JP)
A lithographic projection apparatus comprising:…

Patentorg has 139 documents under Step and Repeat Patents.