Featured patents

Optical Imaging Writer System
US 08670106 B2, March 11, 2014, Jang Fung Chen et al. / PineBrook Imaging, Inc. (Santa Clara, US)
A method for applying mask data patterns to substrate in a lithography…

Scanning Type Exposure Apparatus, Method of Manufacturing Micro-Apparatus, Mask, Projection Optical Apparatus, and Method of Manufacturing Mask
US 08654307 B2, Feb. 18, 2014, Masaki Kato / Nikon Corporation (Tokyo, JP)
A scanning exposure apparatus that exposes a pattern of a first object…

Using Phase Difference of Interference Lithography for Resolution Enhancement
US 08582079 B2, Nov. 12, 2013, Rudolf Hendel et al. / Applied Materials, Inc. (Santa Clara, US)
An interference lithography system comprising:…

Patentorg has 3 documents under Plural Patents.