Featured patents

Manufacture Filtration Elements
US 08790528 B2, July 29, 2014, Masking of a Substrate Using Material Resistant to an Etchant, Kleo Kwok
A method of forming a filter material comprising the steps of:…

Method and System for Fabricating a Narrow Line Structure in a Magnetic Recording Head
US 08871102 B2, Oct. 28, 2014, Forming or Treating Article Containing Magnetically Responsive Material, Wei Gao / Western Digital (Fremont), LLC (Fremont, US
A method for forming a structure in a magnetic recording head from at least…

Plasma Etch Processes for Boron-Doped Carbonaceous Mask Layers
US 08778207 B2, July 15, 2014, Etching elemental carbon containing substrate, Jong Mun Kim et al. / Applied Materials, Inc. (Santa Clara, US)
A method of etching a feature in a boron-doped carbonaceous layer comprising…

Slimming Method of Carbon-Containing Thin Film and Oxidation Apparatus
US 08703000 B2, April 22, 2014, Mask resist contains organic compound, Masayuki Hasegawa et al. / Tokyo Electron Limited JP
A slimming method of a carbon-containing thin film, the slimming method…

Gas Barrier With Vent Ring for Protecting a Surface Region From Liquid
US 08715518 B2, May 6, 2014, Masking of a Substrate Using Material Resistant to an Etchant, Rajesh Kelekar / Intermolecular, Inc. (San Jose, US)
A method for processing a substrate, comprising…

Method of Manufacturing a Magnetic Recording Medium
US 08663486 B2, March 4, 2014, Forming or Treating Article Containing Magnetically Responsive Material, Noboru Kurata / Fuji Electric Co., Ltd. (Kawasaki-shi, JP)
A method of manufacturing a magnetic recording medium, comprising, in the order…

Transmission Electron Microscope Grid and Method for Making Same
US 08623227 B2, Jan. 7, 2014, Removing at least one of the self-sustaining preforms or a portion thereof, Chen Feng et al. / Tsinghua University (Beijing, CN)
A method for making a transmission electron microscope grid, the method…

Laser Processing Method
US 08591753 B2, Nov. 26, 2013, Heating or Baking of Substrate Prior to Etching to Change the Chemical Properties of Substrate Toward the Etchant, Hideki Shimoi et al. / Hamamatsu Photonics K.K. (Hamamatsu-shi, Shizuoka, JP)
A laser processing method of converging a laser light into an object to be…

Method for Backside Polymer Reduction in Dry-Etch Process
US 08529783 B2, Sept. 10, 2013, Using plasma, Chun-Li Chou et al. / Taiwan Semiconductor Manufacturing Co., Ltd. (Hsin-Chu, TW)
A method for etching a substrate comprising:…

Method of Hydrophobizing and Patterning Frontside Surface of Integrated Circuit
US 08491803 B2, July 23, 2013, Forming or Treating Thermal Ink Jet Article, Emma Rose Kerr et al. / Zamtec Ltd (Dublin, IE)
A method of hydrophobizing a nozzle plate of a printhead integrated circuit, said…

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