Featured patents

Method for Manufacturing a Flexible Intraocular Retinal Implant Having Doped Diamond Electrodes
US 08801942 B2, Aug. 12, 2014, Forming or Treating Electrical Conductor Article, Christine Alice Regine Helene Terrades et al. / Commissariat a l'energie atomique et aux energies alternatives (Paris, FR)
A method for manufacturing an intraocular retinal implant, that can stimulate…

Method of Manufacturing Magnetic Recording Medium, and Magnetic Recording and Reproducing Device
US 08790525 B2, July 29, 2014, Forming or Treating Article Containing Magnetically Responsive Material, Akira Yamane et al. / Showa Denko K.K. (Tokyo, JP)
A method of manufacturing a magnetic recording medium, the method comprising:…

Bevel Etcher With Vacuum Chuck
US 08721908 B2, May 13, 2014, Using plasma, Gregory Sexton et al. / Lam Research Corporation (Fremont, US)
A method of reducing curvature of a bowed semiconductor substrate during bevel…

Method of Manufacturing Magnetic Recording Medium
US 08658048 B2, Feb. 25, 2014, Forming or Treating Article Containing Magnetically Responsive Material, Kazuto Yamanaka et al. / Canon Anelva Corporation (Kawasaki-shi, JP)
A method of manufacturing a magnetic recording medium, comprising:…

Piezoelectric Vibrating Pieces Comprising Edge Mesa Steps, and Methods for Manufacturing Same
US 08580126 B2, Nov. 12, 2013, Etching of Semiconductor Material to Produce an Article Having a Nonelectrical Function, Manabu Ishikawa et al. / Nihon Dempa Kogyo Co., Ltd. (Tokyo, JP)
A method for manufacturing a piezoelectric vibrating piece, comprising:…

Masking Material for Dry Etching
US 08524094 B2, Sept. 3, 2013, Forming or Treating Article Containing Magnetically Responsive Material, Isao Nakatani et al. / National Institute for Materials Science (Ibaraki, JP)
A method for producing a tunneling magnetoresistive element having a tunneling…

Semiconductor Device Manufacturing Method and Plasma Etching Apparatus
US 08491805 B2, July 23, 2013, Using plasma, Eiichi Nishimura et al. / Tokyo Electron Limited (Tokyo, JP)
A semiconductor device manufacturing method comprising:…

Substrate Processing Method
US 08491804 B2, July 23, 2013, Masking of sidewall, Eiichi Nishimura et al. / Tokyo Electron Limited (Tokyo, JP)
A method of processing a substrate including a processing target layer…

Method of Processing Graphene Sheet Material and Method of Manufacturing Electronic Device
US 08465661 B2, June 18, 2013, Etching elemental carbon containing substrate, Koji Asano / Fujtsu Limited (Kawasaki, JP)
A method of processing a graphene sheet material comprising:…

Method of Manufacturing Semiconductor Device
US 08480915 B2, July 9, 2013, Etchant contains solid particle, Yukiteru Matsui et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A method of manufacturing a semiconductor device comprising:…

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