Featured patents

Method of Making Bondable Printed Wiring Member
US 08834729 B2, Sept. 16, 2014, Forming or Treating Thermal Ink Jet Article, Charles I. Levey et al. / Eastman Kodak Company (Rochester, US)
A method for making a printed wiring member including wire-bondable contact pads…

Die Press Process for Manufacturing a Z-Directed Component for a Printed Circuit Board
US 08790520 B2, July 29, 2014, Forming or Treating Cylindrical or Tubular Article Having Pattern or Design on Its Surface, Keith Bryan Hardin et al. / Lexmark International, Inc. (Lexington, US)
A method for manufacturing a Z-directed component for insertion into a mounting…

Systematic Packaging Method
US 08721900 B2, May 13, 2014, Forming or Treating Electrical Conductor Article, Jux Win et al. / National Tsing Hua University (Hsinchu, TW)
A systematic packaging method, comprising:…

Laser Marking of a Card
US 08709271 B2, April 29, 2014, Etching using radiation, Jean-Luc Lesur / Gemalto SA (Meudon, FR)
A method for a laser marking of a support comprising a body and a cover…

Methods for Removing Dielectric Materials
US 08703005 B2, April 22, 2014, Substrate contains silicon or silicon compound, Don L. Yates et al. / Micron Technology, Inc. (Boise, US)
A method for removing dielectric materials from a semiconductor device structure,…

Process for Fabricating MEMS Devices
US 08691099 B2, April 8, 2014, Etching of Semiconductor Material to Produce an Article Having a Nonelectrical Function, John Gritters et al.
A process of fabricating a MEMS device in or on a substrate comprised of at least…

Method to Transfer Lithographic Patterns Into Inorganic Substrates
US 08658050 B2, Feb. 25, 2014, Mask is multilayer resist, Michael A. Guillorn et al. / International Business Machines Corporation (Armonk, US)
A method for pattern transfer into an inorganic substrate, comprising the steps…

Etching Solution Composition for Metal Thin Film Consisting Primarily of Copper
US 08580136 B2, Nov. 12, 2013, Etchant contains acid, Kenji Ohshiro et al. / Kanto Kagaku Kabushiki Kaisha (Tokyo, JP)
An etching method comprising:…

Method for Fabricating Pellicle of EUV Mask
US 08535545 B2, Sept. 17, 2013, Forming or Treating Mask Used for Its Nonetching Function, Yong Dae Kim / Hynix Semiconductor Inc. (Gyeonggi-do, KR)
A method for fabricating a pellicle, comprising:…

Method Using Block Copolymers and a Hard Electroplated Mask for Making a Master Disk for Nanoimprinting Patterned Magnetic Recording Disks
US 08512583 B2, Aug. 20, 2013, Masking of a Substrate Using Material Resistant to an Etchant, Ricardo Ruiz et al. / HGST Netherlands B.V. (Amsterdam, NL)
A method for making a mold for making a master disk for use in imprinting…

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