Featured patents

Dishwasher Detergent Dispenser
US 08808466 B2, Aug. 19, 2014, Dishwashing machine, Antony M. Rappette et al. / Whirlpool Corporation (Benton Harbor, US)
A dishwasher comprising:…

Method for Cleaning Platinum Residues on a Semiconductor Substrate
US 08784572 B2, July 22, 2014, One an acid or an acid salt, Anh Duong et al. / Intermolecular, Inc. (San Jose, US)
A method for cleaning platinum residues from a surface of a semiconductor…

Watercraft Surface Cleaning Device and Associated Methods
US 08747565 B1, June 10, 2014, Using solid work treating agents, Walter F. Trzaskus et al. / First-In, LLC (New Smyrna Beach, US)
A submerged surface cleaning device comprising:…

Superimposition of Rapid Periodic and Extensive Post Multiple Substrate UV-ozone Clean Sequences for High Throughput and Stable Substrate to Substrate Performance
US 08702870 B2, April 22, 2014, With pressurized fluid or fluid manipulation, Kelvin Chan et al. / Applied Materials, Inc. (Santa Clara, US)
A method of cleaning a processing chamber, comprising:…

Method of Fabricating Semiconductor Cleaners
US 08647441 B2, Feb. 11, 2014, Including distortion or deformation of work, Frank Weber / Infineon Technologies AG (Neubiberg, DE)
A method for fabricating a semiconductor device, the method comprising:…

Mobile Cleaning Device and Method
US 08632639 B2, Jan. 21, 2014, With pressurized fluid or fluid manipulation, Andre Kluge et al. / Siemens Aktiengesellschaft (Munich, DE)
A method for cleaning different burners, the method comprising:…

Substrate Cleaning Apparatus and Method for Determining Timing of Replacement of Cleaning Member
US 08608858 B2, Dec. 17, 2013, Using solid work treating agents, Satomi Hamada / Ebara Corporation (Tokyo, JP)
A method of determining timing of replacement of a cleaning member in a substrate…

Hard Floor Surface Care Process
US 08545635 B1, Oct. 1, 2013, Using solid work treating agents, Steven D. Azevedo
A hard floor surface care process, said process comprising:…

Ultrasonic Cleaning Method and Apparatus
US 08486199 B2, July 16, 2013, Including application of electrical radiant or wave energy to work, Christian Degel et al. / Lam Research AG (Villach, AT)
A device for treating a surface of an article with a fluid, comprising:…

Apparatus for Wet Processing Substrate
US 08464734 B2, June 18, 2013, With initial work emptying, inverting, orienting or puncturing means, Yun-Fei Lien et al. / Zhen Ding Technology Co., Ltd. (Tayuan, Taoyuan, TW)
An apparatus for wet processing a substrate, the apparatus comprising:…

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