Featured patents

Filter Cleaning System and Method
US 08864913 B2, Oct. 21, 2014, With pressurized fluid or fluid manipulation, Cathy Haglund et al. / United Air Specialists, Inc. (Cincinnati, US)
A filter cleaning system, comprising:…

Submersible Cleaning Robot
US 08757181 B2, June 24, 2014, With fluid discharge reaction nozzle, Takitarou Osaka et al. / Yanmar Co., Ltd. (Osaka, JP)
A submersible cleaning robot cleaning a cleaning subject item by jetting…

Substrate Processing Method, Storage Medium Storing Program for Executing Substrate Processing Method and Substrate Processing Apparatus
US 08728247 B2, May 20, 2014, Including steam, gaseous agent or temperature feature, Yuichiro Inatomi / Tokyo Electron Limited (Tokyo, JP)
A substrate processing method, comprising:…

Method for Cleaning Substrates Utilizing Surface Passivation And/Or Oxide Layer Growth to Protect From Pitting
US 08741066 B2, June 3, 2014, Semiconductor cleaning, Ismail Kashkoush et al.
A method of processing a substrate comprising:…

Method of Removing a Biofilm From a Surface
US 08696820 B2, April 15, 2014, Hollow work, internal surface treatment, Marshall Kerr et al. / Bard Access Systems, Inc. (Salt Lake City, US)
A method of removing a biofilm from a female luer having an outer peripheral…

Photovoltaic Back Contact
US 08603253 B2, Dec. 10, 2013, Semiconductor cleaning, Pratima V. Addepalli et al. / First Solar, Inc. (Perrysburg, US)
A method of cleaning a cadmium telluride surface, comprising removing at least…

Methods for Clearing Blockages in In-Situ Artificial Lumens
US 08603254 B2, Dec. 10, 2013, Hollow work, internal surface treatment, Dana B. Mallen et al. / Actuated Medical, Inc. (Bellefonte, US)
A method for the in situ clearing of blockages in artificial tubes completely…

Method for the Treatment of a Semiconductor Wafer
US 08580046 B2, Nov. 12, 2013, One an acid or an acid salt, Franz Sollinger et al. / Siltronic AG (Munich, DE)
A method of treating a semiconductor wafer, comprising:…

Cleaning Apparatus and Cleaning Method for Wafer
US 08496758 B2, July 30, 2013, Using solid work treating agents, Naoki Idani / Fujitsu Semiconductor Limited (Yokohama, JP)
A cleaning method for a wafer, comprising:…

Dishwashing Machine Equipped With a Sorption Drying Device
US 08459278 B2, June 11, 2013, Heat-exchange means external to work-treating chamber, vat or zone, Kai Paintner et al. / BSH Bosch und Siemens Hausgeraete GmbH (Munich, DE)
A dishwasher comprising:…

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