Featured patents

Liquid Material Dispensing Apparatus and Method of Dispensing Light Emitting Materials for Organic Light Emitting Diode
US 08826849 B2, Sept. 9, 2014, Moving projector, Kyung-Jun Lee / Samsung Display Co., Ltd. (Gyeonggi-do, KR)
A liquid dispensing apparatus comprising:…

Device for Spraying a Reagent for Fast Microbiological Analysis
US 08794176 B2, Aug. 5, 2014, Projection or Spray Type, Frederic Olivieri et al. / EMD Millipore Corporation (Billerica, US)
A device for spraying a reagent onto a support for the fast microbiological…

Methods and Apparatus for a Gas Panel With Constant Gas Flow
US 08728239 B2, May 20, 2014, Gas or Vapor Deposition, Gregory M Bartlett et al. / ASM America, Inc. (Phoenix, US)
A deposition gas panel for a cyclic deposition and etch reaction chamber,…

Semiconductor Process Chamber Vision and Monitoring System
US 08726837 B2, May 20, 2014, With means for visual observation, Kailash K. Patalay et al. / Applied Materials, Inc. (Santa Clara, US)
An optical monitoring system for a semiconductor substrate process chamber…

Masking System for Coating Aircraft Components
US 08720369 B2, May 13, 2014, Work-attached, Richard W. Brown et al. / The Lost Boy Group, LLC (Delray Beach, US)
A masking kit for an aircraft wheel comprising:…

Apparatus, Tool and Methods for Depositing Annular or Circular Wedge Coatings
US 08647437 B2, Feb. 11, 2014, Substrate contacting mask, Moshe Lavi et al. / CI Systems (Israel) Ltd. (Migdal HaEmek, IL
A coating tool for fabrication of an annular or a circular wedged coating…

Substrate Treatment Device
US 08652258 B2, Feb. 18, 2014, Gas or Vapor Deposition, Yasuhiro Inokuchi et al. / Hitachi Kokusai Electric Inc. (Tokyo, JP)
A substrate treatment device configured to alternately supply a Si-containing gas…

Temperature Controlled Plasma Processing Chamber Component With Zone Dependent Thermal Efficiencies
US 08608852 B2, Dec. 17, 2013, Gas or Vapor Deposition, Larry D. Elizaga et al. / Applied Materials, Inc. (Santa Clara, US)
A plasma processing chamber component, comprising:…

Droplet Discharge Device and Method for Forming Thin Film
US 08561570 B2, Oct. 22, 2013, Condition of coated material, Tamotsu Goto et al. / Seiko Epson Corporation (Tokyo, JP)
A droplet discharge device adapted to arrange droplets onto a substrate including…

Apparatus for Making Electrode of Dye-Sensitized Solar Cell in One Working Station
US 08555806 B2, Oct. 15, 2013, With means for moving work through, into or out of pool, Shao-Kai Pei / Hon Hai Precision Industry Co., Ltd. (New Taipei, TW)
An apparatus for making an electrode of a dye-sensitized solar cell,…

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