Featured patents

Direct-Current Plasma CVD Apparatus and Method for Producing Diamond Using the Same
US 08826854 B2, Sept. 9, 2014, By creating electric field, Hitoshi Noguchi / Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)
A direct-current plasma CVD apparatus for growing a diamond, comprising:…

Device for Conveying Honeycomb Structural Body, Method for Sealing Honeycomb Structural Body, and Method for Producing Honeycomb Structural Body
US 08863685 B2, Oct. 21, 2014, Plural treatments, Ying Gong et al. / Sumitomo Chemical Company, Limited (Tokyo, JP)
A conveying apparatus for a honeycomb structure, the apparatus comprising:…

Cluster Type Semiconductor Processing Apparatus
US 08758514 B2, June 24, 2014, Multizone chamber, Takashi Hagino et al. / ASM Japan K.K. (Tokyo, JP)
A cluster type semiconductor processing apparatus comprising:…

Liquid Applying Apparatus and Ink Jet Printing Apparatus
US 08726834 B2, May 20, 2014, Pressure responsive, Yoshinori Nakagawa et al. / Canon Kabushiki Kaisha (Tokyo, JP)
A liquid applying apparatus comprising:…

Robotic Painting System and Method
US 08689730 B2, April 8, 2014, Fluid current projector, e.g., spray type, Scott J. Clifford / Fanuc Robotics America, Inc. (Rochester Hills, US)
A painting system comprising:…

Apparatus for Growth of Dilute-Nitride Materials Using an Isotope for Enhancing the Sensitivity of Resonant Nuclear Reaction Analysis
US 08505481 B2, Aug. 13, 2013, By creating electric field, Stefan P Svensson et al. / The United States of America as represented by the Secretary of the Army (Washington, US)
A semiconductor-nitride assembly for growing and analyzing crystal growth…

Method and Apparatus to Enhance Process Gas Temperature in a CVD Reactor
US 08512472 B2, Aug. 20, 2013, Gas or Vapor Deposition, Kailash Kiran Patalay et al. / Applied Materials, Inc. (Santa Clara, US)
An apparatus for controlling temperature and flow characteristics of a process…

Dimensionally Stable Durable Thermal Spray Masking System
US 08468969 B2, June 25, 2013, Work Surface Shields, Masks or Protectors, Christopher W Strock et al. / United Technologies Corporation (Hartford, US)
A masking system for protecting portions of a turbine engine component being…

Film Deposition Apparatus
US 08465591 B2, June 18, 2013, Multizone chamber, Manabu Honma et al. / Tokyo Electron Limited (Tokyo, JP)
A film deposition apparatus for depositing a film on a substrate by carrying out…

Application Device and Method of Producing Application Layer Using Same
US 08464653 B2, June 18, 2013, Plural projectors, Isao Ebisawa / Casio Computer Co., Ltd. (Tokyo, JP)
An application device comprising:…

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