Featured patents

Method of Fabricating Optical Fiber Using an Isothermal, Low Pressure Plasma Deposition Technique
US 08857372 B2, Oct. 14, 2014, By creating electric field, James Fleming et al.
A deposition process for depositing a first material on an inner wall…

Cladding the Interior of a Straight Pipe Section
US 08757086 B2, June 24, 2014, Inside of hollow work, Randel Brandstrom
Apparatus for cladding an interior surface of a straight pipe comprising:…

Method and Apparatus for Single Side Bilayer Formation
US 08707892 B2, April 29, 2014, With tank structure, liquid supply, control, and / or nonradiant heating means, Geoffrey Alden Barrall et al. / Electronic Biosciences, Inc. (San Diego, US)
An ionic conductance measurement system comprising:…

Painting Robot and Painting System
US 08667926 B2, March 11, 2014, Moving projector, Shingi Takahashi / Kabushiki Kaisha Yaskawa Denki (Kitayushu-Shi, Fukuoka, JP)
A painting robot, comprising;…

Apparatus for Manufacturing Large-Area Carbon Nanotube Films
US 08623144 B2, Jan. 7, 2014, Moving work support, Shou-Shan Fan et al. / Tsinghua University (Beijing, CN)
An apparatus for manufacturing a large-area carbon nanotube film, the apparatus…

Plasma CVD Apparatus, Method for Manufacturing Semiconductor Film, Method for Manufacturing Thin-Film Solar Cell, and Method for Cleaning Plasma CVD Apparatus
US 08631762 B2, Jan. 21, 2014, Producing energized gas remotely located from substrate, Hiroya Yamarin et al. / Mitsubishi Electric Corporation (Tokyo, JP)
A plasma CVD apparatus comprising:…

CVD Apparatus Having a Rotating Heater
US 08585823 B2, Nov. 19, 2013, Substrate heater, Pyung-yong Um / Eugene Technology Co., Ltd. (Yongin, KR)
A chemical vapor deposition (CVD) apparatus, comprising…

Apparatus for the Transfer of a Fluid to a Moving Web Material
US 08511250 B2, Aug. 20, 2013, With Printing, Kim Ellen Shore et al. / The Procter & Gamble Company (Cincinnati, US)
A fluid transfer apparatus comprising:…

Coater, Method for Manufacturing Coated Article, and Fluid Blowing Unit
US 08490571 B2, July 23, 2013, With Heat Exchange, Drying, or Non-Coating Gas or Vapor Treatment of Work, Hiroshi Koizumi et al. / Kabushiki Kaisha Toshiba (Tokyo, JP)
A coater comprising:…

Apparatus for Forming Thin Film and Method of Manufacturing Semiconductor Film
US 08474403 B2, July 2, 2013, By creating electric field, Masakazu Taki et al. / Mitsubishi Electric Corporation (Tokyo, JP)
An apparatus for forming a thin film, comprising:…

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