Featured patents

Marking Apparatus Having Environmental Sensors and Operations Sensors for Underground Facility Marking Operations, and Associated Methods and Systems
US 08770140 B2, July 8, 2014, Control Means Responsive to a Randomly Occurring Sensed Condition, Jeffrey Farr et al. / CertusView Technologies, LLC (Palm Beach Gardens, US)
An apparatus for performing a marking operation to mark on ground, pavement,…

Apparatus for Vapor Condensation and Recovery
US 08728240 B2, May 20, 2014, Gas or Vapor Deposition, Thuc M. Dinh et al. / MSP Corporation (Shoreview, US)
An apparatus for recovery of precursor vapor from a gas and precursor vapor…

Substrate Process Apparatus, Substrate Process Method, and Computer Readable Storage Medium
US 08746170 B2, June 10, 2014, Control Means Responsive to a Randomly Occurring Sensed Condition, Tatsuya Tamura et al. / Tokyo Electron Limited (Tokyo, JP)
A substrate process apparatus that performs a process with respect to a substrate…

Gas Distribution Plate and Substrate Treating Apparatus Including the Same
US 08702867 B2, April 22, 2014, Gas or Vapor Deposition, Chan-Ho Park et al. / Jusung Engineering Co., Ltd. KR
A gas distribution plate that is installed in a chamber providing a reaction…

Thermal Spray Stream Focusing
US 08550028 B2, Oct. 8, 2013, With mask or stencil, Joshua Lee Margolies / General Electric Company (Schenectady, US)
A system, comprising:…

Method and Apparatus for Atomic Layer Deposition
US 08562743 B2, Oct. 22, 2013, Gas or Vapor Deposition, Eric J. Strang / Tokyo Electron Limited (Tokyo, JP)
A high pressure processing system, comprising:…

Method for Coating the Inner Walls of Pipes and Device Suitable Therefor
US 08561569 B2, Oct. 22, 2013, Inside of hollow work, Gabriele Winkler et al. / Siemens Aktiengesellschaft (Munich, DE)
A process for coating the inner walls of pipes, comprising the steps of:…

Substrate Processing Apparatus
US 08529701 B2, Sept. 10, 2013, Chamber seal, Tomoyuki Matsuda et al. / Hitachi Kokusai Electric Inc. (Tokyo, JP)
A substrate processing apparatus comprising:…

Method and Apparatus for Material Deposition
US 08490573 B2, July 23, 2013, Work-confined pool, Joel M. Cook et al. / Lam Research Corporation (Fremont, US)
An apparatus for depositing a material on a surface of a wafer, comprising:…

Developing Apparatus, Resist Pattern Forming Method and Storage Medium
US 08474396 B2, July 2, 2013, With projector heating, cleaning or conditioning, Atsushi Ookouchi et al. / Tokyo Electron Limited (Tokyo, JP)
An apparatus to develop a substrate formed with a resist film and exposed, by…

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