Featured patents

Optimized Double Washer Pull Plug for Minimizing Coating Error
US 08826852 B2, Sept. 9, 2014, Work-attached, Christopher Malone et al. / Engineered Products and Services, Inc. (Franksville, US)
An optimized dual washer pull plug apparatus for masking a mechanical part,…

Optical Thin-Film Vapor Deposition Apparatus and Optical Thin-Film Production Method
US 08826856 B2, Sept. 9, 2014, Multiple gas energizing means associated with one deposition site, Tatsuya Hayashi et al. / Shincron Co., Ltd. (Kanagawa, JP)
An optical thin-film vapor deposition apparatus for vapor depositing a vapor…

Method and System for High-Throughput Deposition of Patterned Organic Thin Films
US 08801856 B2, Aug. 12, 2014, Gas or Vapor Deposition, Paul E. Burrows et al. / Universal Display Corporation (Ewing, US)
A device comprising:…

Semiconductor Manufacturing Apparatus and Semiconductor Manufacturing Method
US 08770138 B2, July 8, 2014, Moving projector, Takashi Tanaka et al. / Tokyo Electron Limited (Tokyo, JP)
A semiconductor manufacturing apparatus comprising:…

PECVD Process Chamber Backing Plate Reinforcement
US 08733279 B2, May 27, 2014, Having glow discharge electrodes, Robin L. Tiner et al. / Applied Materials, Inc. (Santa Clara, US)
A plasma enhanced chemical vapor deposition apparatus, comprising:…

Methods and Apparatuses for Roll-On Coating
US 08739728 B2, June 3, 2014, Rotary applicator, Klaus Conrad Wolke et al. / Dynamic Micro Systems, Semiconductor Equipment GmbH (Radolfzell, DE)
A deposition system for depositing a coating on a substrate, comprising:…

Film Deposition Apparatus and Substrate Processing Apparatus
US 08673079 B2, March 18, 2014, Multizone chamber, Manabu Honma et al. / Tokyo Electron Limited (Tokyo, JP)
A film deposition apparatus for depositing a thin film on a substrate in a vacuum…

Chemical Vapor Deposition Flow Inlet Elements and Methods
US 08636847 B2, Jan. 28, 2014, Gas or Vapor Deposition, Bojan Mitrovic et al. / Veeco Instruments Inc. (Plainview, US)
A chemical vapor deposition reactor comprising:…

Liquid Droplet Discharging Apparatus
US 08555807 B2, Oct. 15, 2013, With Indicating, Testing, Inspecting, or Measuring Means, Kenji Kojima / Seiko Epson Corporation (Tokyo, JP)
A liquid droplet discharging apparatus comprising:…

System and Method for Sealing a Vapor Deposition Source
US 08480805 B2, July 9, 2013, Crucible or evaporator structure, Robert A. Enzenroth et al. / Colorado State University Research Foundation (Fort Collins, US)
A system for coating a substrate, the system comprising:…

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