Featured patents

Method and Apparatus for Thermal Spraying of Metal Coatings Using Pulsejet Resonant Pulsed Combustion
US 08839738 B2, Sept. 23, 2014, With projector heating, cleaning or conditioning, Daniel E. Paxson / The United States of America as Represented by the Administrator of National Aeronautics and Space Administration (Washington, US)
An apparatus for thermally spraying a metal coating comprising:…

Fluid Bed Apparatus for Coating Solid Particles
US 08863686 B2, Oct. 21, 2014, Coating moving mass of solid particulate work, Jürg Paul Ris / GEA Pharma Systems AG (Bubendorf, CH)
A fluid bed apparatus for coating solid particles, comprising…

Electrical Contacts for Use With Vacuum Deposition Sources
US 08871027 B2, Oct. 28, 2014, Crucible or evaporator structure, Scott Wayne Priddy / Veeco Instruments Inc. (Plainview, US)
A vacuum deposition source comprising:…

PECVD Process Chamber Backing Plate Reinforcement
US 08733279 B2, May 27, 2014, Having glow discharge electrodes, Robin L. Tiner et al. / Applied Materials, Inc. (Santa Clara, US)
A plasma enhanced chemical vapor deposition apparatus, comprising:…

Apparatus for Coating Stents
US 08689729 B2, April 8, 2014, Work Holders, or Handling Devices, Joycelyn Amick et al. / Abbott Cardiovascular Systems Inc. (Santa Clara, US)
An apparatus to support a stent during the application of a coating composition…

Apparatus for Atomic Layer Deposition on a Moving Substrate
US 08657959 B2, Feb. 25, 2014, Moving work support, Geoffrey Nunes et al. / E I du Pont de Nemours and Company (Wilmington, US)
Apparatus for atomic layer deposition of a material on a moving substrate,…

Method for the Production of Composite Elements Based on Isocyanate-Based Foams
US 08578876 B2, Nov. 12, 2013, With Means to Centrifuge Work, Michael Thater et al. / BASF Aktiengesellschaft (Ludwigshafen, DE)
An apparatus for application of liquids to a continuously conveyed outer layer,…

Vaporizing Apparatus and Film Forming Apparatus Provided With Vaporizing Apparatus
US 08486196 B2, July 16, 2013, Crucible or evaporator structure, Mitsuru Fukagawa et al. / Kabushiki Kaisha Watanabe Shoko (Tokyo, JP)
An evaporating apparatus including an evaporating head, wherein a dispersion…

Substrate Reactor With Adjustable Injectors for Mixing Gases Within Reaction Chamber
US 08486191 B2, July 16, 2013, Gas or Vapor Deposition, Ravinder Aggarwal et al. / ASM America, Inc. (Phoenix, US)
A reactor for processing substrates, comprising:…

Thin Film, Method and Apparatus for Forming the Same, and Electronic Component Incorporating the Same
US 08480804 B2, July 9, 2013, Crucible or evaporator structure, Kiyoshi Takahashi et al. / Panasonic Corporation (Osaka, JP)
A thin film formation apparatus, comprising:…

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